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首页> 外文期刊>Journal of Applied Polymer Science >SYNTHESIS AND CHARACTERIZATION OF PHOTOSENSITIVE COPOLYSILOXANEIMIDES
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SYNTHESIS AND CHARACTERIZATION OF PHOTOSENSITIVE COPOLYSILOXANEIMIDES

机译：光敏性聚硅氧烷氧亚胺的合成与表征

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Photosensitive copolysiloxaneimides were prepared by adding a photosensitive monomer such as hydroxyethylacrylate (HEA) to copolyisoimides, which were synthesized by the copolycondensation of pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride with oxydianiline, and bis(p-aminophenoxy)dimethylsiloxane. The forming process of isoimide rings caused by the reaction of polyamic acid with dicyclohexylcarbodiimide and the disappearance process of isoimide rings caused by the reaction of copolyisoimide with HEA were monitored in situ by infrared approach. A series of photosensitive copolysiloxaneimides films were prepared, and the desired structure-properties relationships about inherent viscosities, thermal expansion coefficient, thermal stability and glass transition temperature, dielectric constants, moisture absorption, and photosensitivity were also discussed. (C) 1997 John Wiley & Sons, Inc. [References: 11]
机译：通过将光敏单体例如丙烯酸羟乙酯（HEA）添加到共聚异酰亚胺中来制备光敏共聚硅氧烷酰亚胺，所述共聚异酰亚胺是通过均苯四甲酸二酐，二苯甲酮四羧酸二酐与氧二苯胺和双（对氨基苯氧基）二甲基硅氧烷的共缩聚反应合成的。通过红外方法对聚酰胺酸与二环己基碳二亚胺反应引起的异酰亚胺环的形成过程以及共聚异酰亚胺与HEA反应引起的异酰亚胺环的消失过程进行了现场监测。制备了一系列光敏共聚硅氧烷酰亚胺薄膜，并讨论了所需的结构特性与固有粘度，热膨胀系数，热稳定性和玻璃化转变温度，介电常数，吸湿率和光敏性的关系。 （C）1997 John Wiley＆Sons，Inc. [参考：11]

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