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Molecular structure of interfaces between plasma-polymerized acetylene films and steel substrates

机译:等离子体聚合乙炔薄膜与钢基底之间界面的分子结构

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Plasma-polymerized films of acetylene were deposited onto steel substrates in an inductively coupled reactor by exciting the plasma in an argon carrier gas and then injecting the monomer into the afterglow region. The molecular structure of the film/substrate interface was determined using reflection-absorption infrared spectroscopy (RAIR) and X-ray photoelectron spectroscopy (XPS) to characterize the films as a function of thickness. RAIR showed that thick (similar to 900 Angstrom) as-deposited plasma-polymerized acetylene films had a complicated molecular structure and contained methyl and methylene, mono- and disubstituted acetylene, vinyl, and cis- and trans-disubstituted olefin groups. Evidence of oxidation resulting from the reaction of trapped radicals with atmospheric oxygen and moisture to form O-H and C=O groups was also obtained. The molecular structure of thin films (similar to 60 Angstrom) was similar although evidence was obtained to indicate that acetylide groups (H-C=C-) were present at the film/substrate interface. Results obtained using angle-resolved XPS analysis showed that carbonaceous contamination was removed from the substrate and that oxides and hydroxides on the substrate surface, especially FeOOH, were chemically reduced during deposition of the films. XPS also confirmed that plasma-polymerized acetylene films deposited on steel substrates contained drop C-O- and drop C=O groups. Preliminary results also showed that films deposited in an inductively coupled reactor were good primers for rubber-to-metal bonding, whereas films deposited in a capacitively coupled reactor were not. The differences may be due to the wide variety of functional groups found in the former type of films but not in the latter. (C) 1998 John Wiley & Sons, Inc. J Appl Polym Sci 70: 1283-1298, 1998. [References: 31]
机译:通过在氩气载气中激发等离子体,然后将单体注入余辉区域,在感应耦合反应器中将乙炔的等离子体聚合膜沉积到钢基材上。使用反射吸收红外光谱(RAIR)和X射线光电子能谱(XPS)确定膜/基底界面的分子结构,以表征膜的厚度。 RAIR表明,厚的(约900埃)沉积的等离子体聚合乙炔薄膜具有复杂的分子结构,并且包含甲基和亚甲基,单和二取代的乙炔,乙烯基以及顺式和反式二取代的烯烃基团。还获得了由捕获的自由基与大气中的氧气和水分反应形成O-H和C = O基团而引起的氧化的证据。薄膜的分子结构(类似于60埃)相似,尽管已获得证据表明在膜/基底界面处存在乙炔基(H-C = C-)。使用角度分辨XPS分析获得的结果表明,碳质污染物已从基材上去除,并且在薄膜沉积过程中,化学还原了基材表面上的氧化物和氢氧化物,尤其是FeOOH。 XPS还证实,沉积在钢基材上的等离子聚合乙炔膜含有C-O-滴和C = O滴。初步结果还表明,在电感耦合反应器中沉积的膜是橡胶与金属结合的良好底漆,而在电容耦合反应器中沉积的膜则不是。差异可能是由于在前一种类型的薄膜中发现了多种官能团,而在后一种类型中却没有。 (C)1998 John Wiley&Sons,Inc. J Appl Polym Sci 70:1283-1298,1998。[参考:31]

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