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首页> 外文期刊>Journal of Applied Polymer Science >Plasma-Polymerized Hexamethyldisiloxane Films Characterized by Variable-Energy Positron Lifetime Spectroscopy
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Plasma-Polymerized Hexamethyldisiloxane Films Characterized by Variable-Energy Positron Lifetime Spectroscopy

机译：变能量正电子寿命谱表征的等离子聚合六甲基二硅氧烷薄膜

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摘要

Nanometer-size holes in plasma-polymerized thin films were characterized by variable-energy positron lifetime spectroscopy for the first time.Hexamethyldisiloxane (HMDSIO) was plasma-polymerized at different discharge powers (30-105 W) and monomer pressures (1.0-4.9 Pa).The positron lifetime spectra of deposited films were collected at positron energies of 1 and 5 keV.All films showed a well-defined long-lived component due to pick-off annihilation of ortho-positronium (o-Ps).The o-Ps lifetime #tau#_3,reflecting the average size of free-volume holes in the film,increased with an increasing ratio of plasma discharge power,W,and monomer flow rate,F.Based on the empirical relationship between the o-Ps lifetime and the cavity radius,hole volumes were estimated to be 0.19-0.36 nm~3.We also found that the o-Ps intensity,I~3,depends strongly on the same parameter,WlF.Comparison wiht infrared (IR) absorption spectroscopy data showed that Ps formation is suppressed in films wiht fewer organic bonds and higher disorder,i.e.,those increasingly inorganic in nature.
机译：等离子体聚合薄膜中的纳米级孔首次通过可变能量正电子寿命光谱进行了表征。六甲基二硅氧烷（HMDSIO）在不同的放电功率（30-105 W）和单体压力（1.0-4.9 Pa下）进行等离子体聚合）。在正电子能量为1和5 keV的条件下收集沉积膜的正电子寿命谱。由于邻正电子（o-Ps）的an灭，所有膜均显示出明确定义的长寿命成分。 Ps寿命＃tau＃_3，反映了薄膜中自由体积孔的平均尺寸，随等离子体放电功率W和单体流量F的增加而增加。基于o-Ps寿命之间的经验关系腔半径，孔体积估计为0.19-0.36 nm〜3。我们还发现o-Ps强度I〜3很大程度上取决于相同的参数WIF。与红外（IR）吸收光谱数据的比较结果表明，较少有机b的薄膜中的Ps形成受到抑制疾病和高病，即自然上越来越无机化的疾病。

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