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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Electron microscopy studies of a TbNiAl compound processed by the HDDR route
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Electron microscopy studies of a TbNiAl compound processed by the HDDR route

机译：通过HDDR途径处理的TbNiAl化合物的电子显微镜研究

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摘要

A TbNiAl compound processed by the hydrogenation disproportionation desorption recombination route has been studied using a combination of scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The SEM backscattered electron (BSE) images showed fine scale composition variations associated with the disproportionation stage while in the recombination stage no structure was visible. TEM examination showed nanocrystalline regions in the disproportionation stage. Selected area diffraction (SAD) showed the existence of two phases TbD_(2.2)and NiAl in the disproportionation stage and single phase TbNiAl in the recombination stage and the measured d-spacings correlate well with the literature. The distribution of the phases in the disproportionation stage was studied by high-resolution TEM.
机译：结合扫描电子显微镜（SEM）和透射电子显微镜（TEM）研究了通过氢化歧化解吸重组途径处理的TbNiAl化合物。 SEM背散射电子（BSE）图像显示与歧化阶段相关的精细比例组成变化，而在重组阶段则看不到任何结构。 TEM检查显示在歧化阶段的纳米晶体区域。选择性区域衍射（SAD）表明在歧化阶段存在两相TbD_（2.2）和NiAl，在重组阶段存在单相TbNiAl，并且测得的d-间距与文献有很好的相关性。用高分辨率TEM研究了歧化阶段的相分布。

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