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Investigations of X-ray metallic capillaries

机译:X射线金属毛细管的研究

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In our previous contributions [R. Mroczka, G. Zukocinski, A. Kuczumow, J. Alloys Compd. 362 (2004) 88-95; R. Mroczka, G. Zukocinski, A. Kuczumow, Geometrical description of the X-ray capillary and total reflection mirror surfaces with assumed reflection features, J. Alloys Compd. 382 (2004) 311-319], we solved the problem of analytical description of capillaries with designed reflection features. Now, the numerical program for ray tracing simulations was written, fully basing on our original analytical calculation of trajectories. All parameters essential for X-ray capillary optics system, such as point and extended X-ray sources, different ranges of photon energy, geometrical parameters of capillaries, variable surface roughness, different kinds of materials (mainly metals), location of target in relation to capillary, were tested. Profiles of output photon beam on the target were obtained. Here, some results of simulations, such as the influence of the photon energy, the capillary sizes and the internal wall smoothness on the efficiency of propagation were presented. All simulations were helpful in making decisions about the optimal shapes and parameters of capillaries that were manufactured in our laboratory. In the preliminary experimental work, the electrochemical manufacturing of capillaries with the metallic (Cu and Ni) walls was described. The cathode wire was coated with copper layer in controlled electrolytic process. It led to precise formation of the parabolic shape of a core part. Subsequently, a thin layer of nickel was coated in electroless way and electrochemically passivated. Then, a thin copper layer and subsequently, thick nickel one were electroplated, forming the body part of the capillary. The adjustment of the internal walls of the capillaries to the designed shape was controlled with the electron microscope and it was proved that it could be kept within+- 1 mu m scatter on a distance of several centimeters along the main axis. The roughness (rms) of the internal capillary walls was controlled by the atomic force microscope. The roughness was kept in the range of 3.5-5 nm and was in the low limit of allowed levels. The production will be optimized in the future.
机译:在我们以前的贡献中[R. Mroczka,G。Zukocinski,A。Kuczumow,J。Alloys Compd。 362(2004)88-95; R. Mroczka,G。Zukocinski,A。Kuczumow,具有假定反射特征的X射线毛细管和全反射镜表面的几何描述,J。Alloys Compd。 382(2004)311-319],我们解决了具有设计反射特征的毛细管的分析描述问题。现在,完全基于我们对轨迹的原始分析计算,编写了用于光线跟踪模拟的数值程序。 X射线毛细管光学系统必不可少的所有参数,例如点和扩展X射线源,不同的光子能量范围,毛细管的几何参数,可变的表面粗糙度,不同种类的材料(主要是金属),目标相对位置去毛细管,进行测试。获得了目标上输出光子束的轮廓。在此,给出了一些仿真结果,例如光子能量,毛细管尺寸和内壁光滑度对传播效率的影响。所有模拟有助于做出关于在我们实验室中制造的毛细管的最佳形状和参数的决策。在初步的实验工作中,描述了具有金属(铜和镍)壁的毛细管的电化学制造。阴极线在受控的电解过程中涂有铜层。它导致了核心零件的抛物线形状的精确形成。随后,以化学方式涂覆镍薄层并进行电化学钝化。然后,先电镀一层薄铜层,然后再电镀一层厚镍,形成毛细管的主体部分。用电子显微镜控制了毛细管的内壁到设计形状的调节,并且证明了它可以在沿主轴几厘米的距离上保持在±1μm的散射范围内。内部毛细管壁的粗糙度(rms)由原子力显微镜控制。粗糙度保持在3.5-5nm的范围内并且在允许水平的下限内。未来将优化生产。

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