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首页> 外文期刊>Journal of cosmetic and laser therapy >Photometric and clinical assessment of localized UVB phototherapy systems for the high-dosage treatment of stable plaque psoriasis.
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Photometric and clinical assessment of localized UVB phototherapy systems for the high-dosage treatment of stable plaque psoriasis.

机译：用于稳定剂量斑块状牛皮癣的高剂量治疗的局部UVB光疗系统的光度学和临床评估。

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BACKGROUND: Ultraviolet-B (UVB) light sources are widely used for the safe and effective treatment of inflammatory skin conditions. The recent commercial introduction of fiber-coupled UVB phototherapy systems facilitates the selective exposure and treatment of localized psoriasis plaques while permitting the safe use of high-dosage treatments. OBJECTIVE: In this study, the performance characteristics and clinical outcome of psoriasis treatments were assessed when using two technologically distinct sources of high-intensity, fiber-optically delivered therapeutic UVB. METHODS: A pulsed, monochromatic 308 nm excimer laser and a continuous-wave, incoherent UVB light source were compared using photosensitive recording papers, images captured with a CCD camera, and on the healthy and lesional skin of ten psoriasis patients. RESULTS: Beam profile analyses and minimal erythema dose (MED) test spots revealed distinct energy distribution patterns from the two devices. The Guassian-type laser beam energy distribution complicated MED determinations, whereas skin exposed to light from the incoherent UVB system developed a more uniform erythema. Both systems cleared the treated psoriasis plaques equivalently, requiring no more than two to five weeks of high-dose treatments. CONCLUSION: When used at equally erythemogenic high doses, both systems produced rapid plaque clearance with minimal side effects. Unlike conventional phototherapy, localized UVB minimizes exposure to the healthy skin, making it suitable for patients with mild to moderate psoriasis, individuals with recalcitrant plaques and for the successful treatment of lesions occurring on most body sites.
机译：背景：紫外线B（UVB）光源被广泛用于安全有效地治疗炎症性皮肤疾病。光纤耦合UVB光疗系统的最新商业推广有助于选择性暴露和局部牛皮癣斑块的治疗，同时允许安全使用高剂量治疗。目的：在本研究中，使用两种技术上不同的高强度，光纤递送治疗性UVB来源，评估了牛皮癣治疗的性能特征和临床结果。方法：使用光敏记录纸，用CCD相机拍摄的图像以及在10名牛皮癣患者的健康和病变皮肤上比较了脉冲单色308 nm准分子激光和连续波非相干UVB光源。结果：光束轮廓分析和最小红斑剂量（MED）测试点揭示了两种设备的明显能量分布模式。高斯型激光束的能量分布使MED的测定变得复杂，而暴露于非相干UVB系统光的皮肤则形成了更均匀的红斑。两种系统均能等效地清除治疗过的牛皮癣菌斑，需要不超过两到五周的大剂量治疗。结论：当以相同的促红血球高剂量使用时，两个系统均能快速清除斑块，且副作用最小。与传统的光疗不同，局部UVB可以最大程度地减少健康皮肤的暴露，使其适合于轻度至中度牛皮癣患者，顽固性斑块患者以及成功治疗大多数身体部位发生的病变。

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