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The toughness of free-standing CVD diamond

机译:独立式CVD钻石的韧性

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A four-point bend test was used to determine the fracture toughness of mechanical grade and di-electric (optical) grade chemical vapour deposited (CVD) diamond. The validity of the test was first confirmed by measuring the toughness of alumina and confirming the results with literature values. The toughnesses of both types of CVD were similar; 8.5 +/- 1.0 and 8.3 +/- 0.4 MParootm respectively. This is higher than the value of 3.4 +/- 0.5 MParootm measured for good quality natural diamond by Field and Freeman, [ 1] using an indentation technique. It is suggested that this is primarily due to differences in surface roughness. There were enough samples to make a preliminary study of the effect of temperature and these data are reported. (C) 2004 Kluwer Academic Publishers. [References: 36]
机译:使用四点弯曲测试来确定机械级和介电(光学)级化学气相沉积(CVD)金刚石的断裂韧性。首先通过测量氧化铝的韧性并用文献值确认结果来确认测试的有效性。两种类型的CVD的韧性都相似。根压力分别为8.5 +/- 1.0和8.3 +/- 0.4 MPa。这高于Field和Freeman [1]使用压痕技术为优质天然钻石测得的3.4 +/- 0.5 MPa根的值。建议这主要是由于表面粗糙度的差异。有足够的样本可以对温度的影响进行初步研究,并记录了这些数据。 (C)2004 Kluwer学术出版社。 [参考:36]

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