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首页> 外文期刊>Journal of Materials Science >RECOVERY OF STOICHIOMETRY OF TA2O5 PREPARED BY KRF EXCIMER LASER CVD FROM TANTALUM METHOXIDE USING MICROWAVE DISCHARGE OF OXYGEN GAS
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RECOVERY OF STOICHIOMETRY OF TA2O5 PREPARED BY KRF EXCIMER LASER CVD FROM TANTALUM METHOXIDE USING MICROWAVE DISCHARGE OF OXYGEN GAS

机译：用KRF准分子激光CVD法从甲醇中回收钽氧化物回收的TA2O5的化学计量学。

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摘要

A flow of oxygen gas activated by passing through a microwave discharge plasma in a 100 and 200 W field was introduced into a deposition cham ber for tantalum oxide deposition by KrF laser photolysis of Ta(OCH3)(5), and the change of the non-stoichiometry of deposit was examined under the laser condition of 120 Hz and 200 Jm(-2). The stoichiometry of the deposit could be improved to a value of about 90% under the condition of rather low supply rate of Ta(OCH3)(5) (100 mg h(-1)). An effect of post-treatment laser following chemical vapour deposition (CVD) by KrF laser and/or microwave discharge of oxygen gas was also investigated, and it was found that activated oxygen species formed by KrF laser irradiation in an oxygen gas atmosphere which passed through a microwave discharge was effective in enhancing the oxidation of non-stoichiometric tantalum oxide prepared by KrF laser CVD. [References: 18]
机译：通过在100和200 W的磁场中通过微波放电等离子体而激活的氧气流被引入用于通过Ta（OCH3）（5）的KrF激光光解法沉积氧化钽的沉积室中，在120 Hz和200 Jm（-2）的激光条件下检查沉积物的化学计量。在Ta（OCH3）（5）（100 mg h（-1））的供给率相当低的条件下，沉积物的化学计量可以提高到大约90％的值。还研究了通过KrF激光进行化学气相沉积（CVD）和/或微波释放氧气后处理激光的效果，发现通过KrF激光辐照的氧气在经过氧气的气氛中形成的活性氧种类微波放电有效地增强了通过KrF激光CVD制备的非化学计量钽氧化物的氧化。 [参考：18]

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