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首页> 外文期刊>Journal of Low Power Electronics >Sub-Threshold Delay and Power Analysis of Complementary Metal-Oxide Semiconductor Buffer Driven Interconnect Load for Ultra Low Power Applications
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Sub-Threshold Delay and Power Analysis of Complementary Metal-Oxide Semiconductor Buffer Driven Interconnect Load for Ultra Low Power Applications

机译:超低功耗应用中互补金属氧化物半导体缓冲器驱动的互连负载的亚阈值延迟和功率分析

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In this paper, analytical models for timing analysis of a complementary metal-oxide semiconductor buffer driven resistance-inductance-capacitance interconnect load in sub-threshold regime of operation have been proposed. Closed form expressions are given for estimating the output voltage and propagation delay. Analytical model is also provided for resistive current and power estimation. It is shown that operating transistor in the sub-threshold region leads to an order of saving in power dissipation in comparison to normal strong inversion. Therefore, sub-threshold regime is highly suitable for ultra low power circuit design. The analysis has been carried out for three technology nodes viz. 130 nm, 90 nm and 65 nm. The results are verified using SPICE simulations. A good agreement is found between the analytical and the simulation results.
机译:本文提出了用于亚阈值工作状态下互补金属氧化物半导体缓冲器驱动的电阻-电感-电容互连负载时序分析的分析模型。给出了闭合形​​式的表达式,用于估计输出电压和传播延迟。还提供了用于电阻电流和功率估计的分析模型。结果表明,与正常的强反相相比,在亚阈值区域中工作的晶体管导致节省功率的顺序。因此,亚阈值范围非常适合于超低功耗电路设计。已经对三个技术节点进行了分析。 130 nm,90 nm和65 nm。使用SPICE仿真对结果进行验证。在分析结果和模拟结果之间找到了很好的一致性。

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