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首页> 外文期刊>Journal of Materials Science Letters >Yttrium segregation in the depth profile of ZrO2-Y2O3 films with argon or oxygen ion irradiation
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Yttrium segregation in the depth profile of ZrO2-Y2O3 films with argon or oxygen ion irradiation

机译：氩或氧离子辐照ZrO2-Y2O3薄膜深度分布中的钇偏析

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摘要

The Y2O3-partially-stabilized ZrO2 thin films have been used in many different applications including thin film optics, thermal barrier coatings and hard overlayers. Usually the films produced with plasma vapour deposition (PVD), magnetron sputter deposition, plasma spraying, etc., have poor adhesion strength to the substrate. Great efforts are being made to improve the adhesion of such films to substrates by many methods [1-4]. It is found that ion irradiation often increases the adhesion of the film to the substrate. In many cases, the bonds spanning the interface between the film and the substrate are formed by using ion beam mixing, the nature of such a process allows any element to be mixed in the interface region in a controlled and reproducible manner that is independent of most equilibrium constraints. Intentionally added reactive species are used to form the desirable interface which consists of a continuity of complex or intermetallic bonding from atoms bound in the substrate matrix to others bound within the film. In other cases, the formation of stably bonded complex structures with alteration of the elemental abundances at the interface of immiscible and nonreac-tive materials can be made in order to enhance adhesion.
机译：Y2O3部分稳定的ZrO2薄膜已用于许多不同的应用，包括薄膜光学器件，热障涂层和硬覆盖层。通常，用等离子气相沉积（PVD），磁控溅射沉积，等离子喷涂等生产的膜对基材的粘合强度较差。通过许多方法[1-4]，人们正在努力改善这种膜对基材的粘附性。已经发现，离子辐照通常会增加薄膜对基材的粘附力。在许多情况下，通过使用离子束混合来形成跨膜与基材之间的界面的键，这种方法的本质是使任何元素都能以可控且可复制的方式在界面区域中进行混合，而这种方式与大多数情况无关。平衡约束。故意添加的反应性物质用于形成所需的界面，该界面由从结合在基质基质中的原子到结合在薄膜中的其他原子的复杂或金属间键合的连续性组成。在其他情况下，可以形成稳定结合的复杂结构，并在不混溶和非反应性材料的界面处改变元素丰度，以增强附着力。

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