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首页> 外文期刊>Journal of Nanophotonics >Noncontact optical metrologies for Young's modulus measurements of nanoporous low-k dielectric thin films
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Noncontact optical metrologies for Young's modulus measurements of nanoporous low-k dielectric thin films

机译：用于纳米多孔低k介电薄膜的杨氏模量测量的非接触光学计量学

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摘要

Brillouin light scattering (BLS) and picosecond laser ultrasonics (PLU) are two noncontact optical techniques that have garnered significant interest for thin film elastic constant measurements. PLU and BLS measurements were utilized to determine the elastic constants of 100 to 500 nm thick nanoporous low-k dielectric materials of significant interest for reducing capacitive delays in nanoelectronic interconnect circuits. PLU measurements with and without a metal acousto-optic transducer are described in detail and compared to previously reported BLS measurements. The values of Young's modulus determined by both BLS and PLU were found to be in excellent agreement and consistent with nanoindentation measurements on thicker 2 micrometer films. While successful BLS measurements were achieved for films as thin as 100 nm, PLU measurements were limited to > ～ 200 nm thick films due to experimental constraints on observing acoustic pulses in thinner films. However, these results clearly demonstrate the capability of both BLS and PLU to determine the elastic constants of low-k dielectric materials at the desired thickness targets for future nanoelectronic interconnect technologies.
机译：布里渊光散射（BLS）和皮秒激光超声（PLU）是两种非接触式光学技术，已引起人们对薄膜弹性常数测量的极大关注。利用PLU和BLS测量来确定100到500 nm厚的纳米多孔低k介电材料的弹性常数，这对于减少纳米电子互连电路中的电容性延迟非常重要。详细介绍了带有和不带有金属声光换能器的PLU测量，并将其与先前报道的BLS测量进行了比较。发现由BLS和PLU测得的杨氏模量值非常吻合，并且与较厚的2微米薄膜上的纳米压痕测量结果一致。虽然成功地对100 nm薄膜进行了BLS测量，但由于实验上对观察较薄薄膜中的声脉冲的限制，PLU测量仅限于厚度大于〜200 nm的薄膜。然而，这些结果清楚地证明了BLS和PLU都具有确定低k介电材料在未来纳米电子互连技术所需厚度目标下的弹性常数的能力。

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