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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >On measurement of optical band gap of chromium oxide films containing both amorphous and crystalline phases
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On measurement of optical band gap of chromium oxide films containing both amorphous and crystalline phases

机译：含非晶相和晶相的氧化铬膜的光学带隙的测量

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摘要

A method to calculate the optical band-gap of thin films composed of both crystalline phase and amorphous phase is suggested. Chromium oxide films were taken for the optical band-gap measurement, and the results were compared with those obtained by the conventional method. There is discrepancy between the values calculated by two different methods. The discrepancy decreases as the deposition temperature increases to the point where crystalline peaks occur. It has been speculated that the simple Tauc's relation for pure amorphous film would lead to an underestimation of the fundamental band-gap of the film composed of both amorphous and crystalline phases. A modified Tauc's equation, delta = f(1) delta(c) + (1 - f(1))delta(a), approach suggested by Krankenhagen et al. [J. Non-Cryst. Solids 198-200 (1996) 923] yields optical band-gap of the Cr2O3 Nm in the range of 4.7 similar to 5 eV when the deposition temperature was varied from room temperature to 300 degrees C. (C) 1997 Elsevier Science B.V.
机译：提出了一种计算由晶相和非晶相组成的薄膜的光学带隙的方法。拍摄氧化铬膜用于光学带隙测量，并将结果与​​通过常规方法获得的结果进行比较。通过两种不同的方法计算出的值之间存在差异。随着沉积温度升高到出现晶体峰的点，差异减小。已经推测，对于纯非晶膜的简单Tauc关系将导致低估由非晶相和结晶相组成的膜的基本带隙。 Krankenhagen等人建议的方法是修改过的Tauc方程delta = f（1）delta（c）+（1- f（1））delta（a）。 [J.非Cryst。当沉积温度从室温变化到300摄氏度时，固体198-200（1996）923]产生的Cr2O3 Nm的光学带隙在4.7的范围内，类似于5 eV。（C）1997 Elsevier Science B.V.

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