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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Comparisons of tin depth profile analysis in float glass
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Comparisons of tin depth profile analysis in float glass

机译：浮法玻璃中锡深度分布分析的比较

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摘要

Data are presented showing the profile of tin diffusion during the production of float glass, by measuring non-destructively the refractive index profiles in the diffused layer. The optical waveguide modes give unequivocal evidence for an anomaly in the tin depth distribution. The results are compared with those from sectioning techniques, used in depth profiles determined by ion beam analyses and cathodoluminescence (CL). There is agreement between these methods which confirm the presence of a maximum in the tin concentration below the surface which had been in contact with the tin bath (this had been linked by Mossbauer data to a rise in the Sn4+ concentration). The ion beam analyses record different depth profiles for Si, Na and Ca. The Sn4+ feature increases the refractive index, as does the diffusion of Sn2+. The index becomes constant at large tin concentrations. We suggest that Sn4+ is linked to CL emission at 2.68 eV and Sn2+ to the 1.97 eV CL emission. Iron impurities give a 1.73 eV signal. Contrary to earlier suggestions, we prc,pose that the luminescence associated with the presence of tin arises from intrinsic defects stabilised by the tin, not from tin acting directly as a luminescence site. (C) 1998 Elsevier Science B.V. [References: 25]
机译：通过非破坏性地测量扩散层中的折射率分布，给出了显示浮法玻璃生产过程中锡扩散分布的数据。光波导模式为锡深度分布的异常提供了明确的证据。将结果与通过离子束分析和阴极发光（CL）确定的深度剖面中使用的切片技术的结果进行比较。这些方法之间的一致性证实了在与锡浴接触的表面以下存在最大的锡浓度（这已通过Mossbauer数据与Sn4 +浓度的升高相关联）。离子束分析记录了Si，Na和Ca的不同深度剖面。 Sn4 +的特征增加了折射率，Sn2 +的扩散也增加了折射率。在大锡浓度下，该指数变得恒定。我们建议Sn4 +与2.68 eV的CL发射相关，而Sn2 +与1.97 eV的CL发射相关。铁杂质产生1.73 eV信号。与先前的建议相反，我们认为与锡的存在有关的发光是由锡稳定的固有缺陷引起的，而不是由锡直接充当发光位点引起的。 （C）1998 Elsevier Science B.V. [参考：25]

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