Structural relaxation in sputter-deposited silica glass

Hirose T; Saito K; Ikushima AJ

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Structural relaxation in sputter-deposited silica glass

机译：溅射沉积石英玻璃的结构弛豫

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We investigated structural relaxation below the glass transition temperature in sputter-deposited silica glass. Structural relaxation was obtained from annealing behavior of the IR reflection structural band position. Results were compared with that of bulk silica glass. Results showed the following. (1) The structural relaxation time is 10(6) times shorter than that of bulk silica glass. (2) The activation energy is close to that of bulk silica glass. (3) Once the structural relaxation reaches a steady state, the structure of silica glass film resembles that of bulk silica glass. (c) 2006 Elsevier B.V. All rights reserved.

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《Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites》 |2006年第22期|共6页
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Hirose T; Saito K; Ikushima AJ;
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正文语种 eng
中图分类晶体学;
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films and coatings; sputtering; optical properties; FTIR measurements; oxide glasses; silica; viscosity and relaxation; stress relaxation; structural relaxation; viscoelasticity; viscosity; OXIDE FILMS; AMORPHOUS SIO2; TEMPERATURE; DENSIFICATION; SIO2-FILMS; SURFACE;

机译：薄膜和涂层;溅射;光学性能;FTIR测量;氧化物玻璃;二氧化硅;粘度和松弛;应力松弛;结构松弛;粘弹性;粘度;氧化物薄膜;无定形的SIO2;温度;致密化;SIO2-薄膜;表面;

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Structural relaxation in sputter-deposited silica glass

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