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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Correlation between the 2.7 eV and 4.3 eV photoluminescence bands in silica glass
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Correlation between the 2.7 eV and 4.3 eV photoluminescence bands in silica glass

机译：石英玻璃中2.7 eV和4.3 eV光致发光带之间的相关性

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摘要

Our previous studies have reported the excitation energy dependence of the 2.7 and 4.3 eV photoluminescence (PL) bands in oxygen deficient silica glass at low temperature (similar to 20 K). An oxygen vacancy (O-3 equivalent to Si-Si equivalent to O-3) was thought to be the origin of the two PL bands. In order to verify the origin of the 2.7 and 4.3 eV PL bands in silica glass, we measured the PL band of various thermally heat treated silica glasses. In the sample after heat treatment, we did not observe the 4.3 eV PL band, though we did observe the 2.7 eV PL band. These results suggest that these two PL bands do not have a common origin. (c) 2006 Elsevier B.V. All rights reserved.
机译：我们以前的研究已经报道了缺氧石英玻璃在低温（类似于20 K）下2.7和4.3 eV光致发光（PL）带的激发能依赖性。氧空位（O-3相当于Si-Si相当于O-3）被认为是两个PL带的起源。为了验证石英玻璃中2.7和4.3 eV PL带的起源，我们测量了各种热处理过的石英玻璃的PL带。在热处理后的样品中，虽然观察到了2.7 eV PL带，但未观察到4.3 eV PL带。这些结果表明这两个PL带没有共同的起源。 （c）2006 Elsevier B.V.保留所有权利。

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