Topological and topological-electronic correlations in amorphous silicon

Pan Y; Zhang ML; Drabold DA

首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Topological and topological-electronic correlations in amorphous silicon

【24h】

Topological and topological-electronic correlations in amorphous silicon

机译：非晶硅中的拓扑和拓扑电子相关性

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

in this paper, we study several structural models of amorphous silicon, and discuss structural and electronic features common to all. We note spatial correlations between short bonds, and similar correlations between long bonds. Such effects persist under a first principles relaxation of the system and at finite temperature. Next we explore the nature of the band tail states and find the states to possess a filamentary structure. We detail correlations between local geometry and the band tails. (c) 2008 Elsevier B.V. All rights reserved.

著录项

来源
《Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites》 |2008年第29期|共6页
作者
Pan Y; Zhang ML; Drabold DA;
展开▼
作者单位

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类晶体学;
关键词
silicon; electrical and electrical properties; ab initio; BAND-TAIL STATES; STRUCTURAL MODELS; DIAMOND; SI;

机译：硅;电学和电气性能;从头开始;束缚态;结构模型;金刚石;SI;

相似文献

外文文献
中文文献
专利

1. Topological and topological-electronic correlations in amorphous silicon [J] . Pan Y, Zhang ML, Drabold DA Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2008,第29期

机译：非晶硅中的拓扑和拓扑电子相关性
2. Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si~* and SiH~* [J] . Yeonwon Kim, Kosuke Hatozaki, Yuji Hashimoto, Japanese journal of applied physics . 2013,第11Issue2期

机译：非晶硅膜中硅团簇的体积分数与Si〜*和SiH〜*的发光特性的相关性
3. Ultrasmooth growth of amorphous silicon films through ion-induced long-range surface correlations [J] . A. Redondo-Cubero, R. Gago, L. Vazquez Applied Physics Letters . 2011,第1期

机译：通过离子诱导的长距离表面相关性超结晶生长非晶硅膜
4. Correlations between higher-order rings and microvoids in hydrogenated amorphous silicon [C] . Parthapratim Biswas, David Alan Drabold Materials Research Society Meeting . 2014

机译：氢化无定形硅中高阶环和微摩擦之间的相关性
5. A magnetic resonance investigation of trivalent silicon centers in amorphous silicon dioxide and amorphous silicon nitride. [D] . Warren, William Leo. 1990

机译：非晶态二氧化硅和非晶态氮化硅中三价硅中心的磁共振研究。
6. Characterization of Doped Amorphous Silicon Thin Films through the Investigation of Dopant Elements by Glow Discharge Spectrometry. A Correlation of Conductivity and Bandgap Energy Measurements [O] . Pascal Sánchez, Olaya Lorenzo, Armando Menéndez, 2011

机译：通过辉光放电光谱研究掺杂元素来表征非晶硅薄膜。电导率和带隙能量测量的相关性
7. Topological and topological-electronic correlations in amorphous silicon [O] . Pan, Yue, Zhang, Mingliang, Drabold, D. A. 2007

机译：非晶硅中的拓扑和拓扑 - 电子相关性

Topological and topological-electronic correlations in amorphous silicon

摘要

著录项

相似文献

相关主题

期刊订阅