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Vacuum-deposited poly(o-methoxyaniline) thin films: Structure and electronic properties

机译:真空沉积聚(邻甲氧基苯胺)薄膜:结构和电子性能

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Thin poly(o-methoxyaniline) (POMA) films have been formed by thermovacuum deposition in the temperature range of 350-450 degrees C and at a pressure of 5 x 10(-5) Torr. The structure properties of vacuum deposited POMA films according to FTIR and UV-VIS spectra are similar to those observed for the emeraldine form of polyaniline. Current-voltage characteristics (I-V) of sandwichtype device ITO/POMA/A1 possess rectifying properties with the ideality factor approximate to 4 at room temperature. On the basis of the dependence of conductivity on frequency in the frequency range of 10 Hz to 1 MHz, it is shown that the Pollack-Pohl current flow hopping mechanism dominates in a polymer film: Such mechanism is typical of non-ordered systems. (c) 2008 Elsevier B.V. All rights reserved.
机译:薄的聚(邻甲氧基苯胺)(POMA)薄膜是通过在350-450摄氏度的温度范围内,在5 x 10(-5)托的压力下进行热真空沉积而形成的。根据FTIR和UV-VIS光谱真空沉积的POMA薄膜的结构性质与聚苯胺的翡翠形式观察到的相似。夹层型器件ITO / POMA / A1的电流-电压特性(I-V)具有整流特性,在室温下的理想因子约为4。根据电导率对10 Hz到1 MHz频率范围内频率的依赖性,可以证明Pollack-Pohl电流跳变机制在聚合物膜中占主导地位:这种机制是非有序系统的典型特征。 (c)2008 Elsevier B.V.保留所有权利。

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