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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Silica nano-rings and nano-hollows: Preparation and UV photoluminescence emission
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Silica nano-rings and nano-hollows: Preparation and UV photoluminescence emission

机译：二氧化硅纳米环和纳米空洞：制备和紫外光致发光

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摘要

By annealing fused silica coated with ultra-thin Ag film, silica nano-rings and nano-hollows were prepared on the substrate. The Ag nano-particles attached on the wall of nano-hollows or embedded in silica were confirmed with energy dispersive spectroscopy and transmission electron microscopy. Besides the well-known characteristic stretching bands of silica, three novel stretching bands around 1579, 1320 and 270 cm(-1) were found in the annealed Ag-coated silica by Raman scattering spectroscopy, which have been attributed to the O-2 in ground state, O-O and metal-oxygen stretching bands, respectively. The formation mechanism of nano-rings and nano-hollows has been discussed based on the experimental results. An ultraviolet photoluminescence emission of 360-370 nm from annealed Ag-coated silica was found when the excitations were 230 nm and 280 nm or longer. The possible photoluminescence emission mechanism has been discussed, which suggests that oxygen excess defects are responsible for the photoluminescence emission, and photoexcitation occurs in the silica as well as in Ag+ ions.
机译：通过对涂有超薄银膜的熔融二氧化硅进行退火，可以在基板上制备二氧化硅纳米环和纳米空心体。通过能量色散光谱和透射电子显微镜确认了附着在纳米空洞壁上或嵌入二氧化硅中的银纳米粒子。除了众所周知的二氧化​​硅特征拉伸带外，通过拉曼散射光谱法在退火的涂银二氧化硅中发现了三个新的拉伸带，分别位于1579、1320和270 cm（-1）附近，这归因于O-2基态，OO和金属氧拉伸带。根据实验结果，探讨了纳米环和纳米空洞的形成机理。当激发为230nm和280nm或更长时，发现从退火的Ag涂覆的二氧化硅发出360-370nm的紫外光致发光。讨论了可能的光致发光发射机理，这表明氧过量缺陷是造成光致发光发射的原因，并且在二氧化硅以及Ag +离子中都发生了光激发。

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