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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Fluorine incorporation in silica glass by the MCVD process: Study of fluorine incorporation zone, evaluation of optical properties and structure of the glass
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Fluorine incorporation in silica glass by the MCVD process: Study of fluorine incorporation zone, evaluation of optical properties and structure of the glass

机译:通过MCVD工艺在石英玻璃中掺入氟:研究氟掺入区,评估玻璃的光学性能和结构

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A theoretical approach was made to find out a complete fluorine incorporation zone on a ternary diagram which serves as a useful graphical representation to select the flows of the supplied reagents for incorporation of the suitable amount of fluorine into cladding glass of optical fiber preform made by the MCVD process using CCl2F2 as a source of fluorine under oxygen abundance, oxygen deficiency and intermediate oxygen state conditions. The possible mechanism for incorporation of fluorine into cladding glass of optical fiber is also evaluated on the basis of the thermodynamical data. The fluorine incorporation mechanism in silica glass by the MCVD process is found to be dependent on the CCl2F2/SiCl4 ratio in the input gas mixture. Fluorine doping is found to be effective for removing the strained Si-O-Si bonds, which govern the optical transparency in deep ultra-violet (DUV) and vacuum Ultra-violet (VUV) regions. The maximum refractive index depression of -0.5 x 10(-3) is obtained with incorporation of fluorine into silica cladding glass by the MCVD process using CCl2F2 as a dopant precursor with suitable flow of SiCl4 vapor along with O-2 through backward deposition pass. The structure of fluorine doped silica glass preform samples containing 1.70-1.79 mol% fluorine incorporated by the MCVD process based on the analyses of F-19 MAS spectra done by high-resolution F-19 NMR spectroscopy reveal the presence of two distinct types of fluorine environments. The majority of the fluorine environments are formed in SiO1.5F polyhedral and less abundant species is observed to be highly unusual, yielding a fivefold coordinated silicon of the type SiO2F polyhedral which become increased with increasing the fluorine content.
机译:采取了一种理论方法,在三元图上找出了一个完整的氟引入区,该区用作有用的图形表示,用于选择所提供的试剂的流量,以将适量的氟掺入到由氟橡胶制成的光纤预制棒的包层玻璃中。在氧丰度,缺氧和中等氧状态条件下,使用CCl2F2作为氟源的MCVD工艺。还根据热力学数据评估了将氟掺入光纤包层玻璃的可能机理。发现通过MCVD工艺在石英玻璃中的氟结合机理取决于输入气体混合物中的CCl2F2 / SiCl4比。发现氟掺杂可有效去除应变的Si-O-Si键,该键控制着深紫外(DUV)和真空紫外(VUV)区域的光学透明性。通过使用CCl2F2作为掺杂剂前体的MCVD工艺将氟掺入到石英覆层玻璃中,可以实现最大折射率降低-0.5 x 10(-3),SiCl4蒸气与O-2一起通过后向沉积道次流过。基于高分辨率F-19 NMR光谱对F-19 MAS光谱的分析,通过MCVD工艺掺入的含氟1.70-1.79 mol%的氟掺杂石英玻璃预成型样品的结构揭示了两种不同类型的氟的存在环境。大多数的氟环境是在SiO1.5F多面体中形成的,观察到数量较少的物种非常不寻常,产生了SiO2F多面体类型的五配位硅,随着氟含量的增加而增加。

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