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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Characterization of electrodeposited Ni and Ni80Fe20 nanowires
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Characterization of electrodeposited Ni and Ni80Fe20 nanowires

机译：电沉积的Ni和Ni80Fe20纳米线的表征

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In this work we use nanoporous alumina substrates as templates for the growth of Ni and Ni80Fe20 nanowires. Our membranes were obtained by a two-step anodization process of high-purity aluminum foils: first anodizations were performed at 40 V for 15 h in 0.3 M oxalic acid, at 2-6 degrees C; the second anodization was carried out using the same conditions for 30 min, resulting in pore lengths of similar to 1.3 mu m. After the second anodization, the pore bottom barrier-layer was thinned, to allow the current to flow through electron tunneling. A pulsed electrodeposition method was then used to grow Ni and Ni80Fe20 nanowires. Transport characterization and isothermal magnetization measurements performed on the produced arrays are presented.
机译：在这项工作中，我们使用纳米多孔氧化铝基质作为Ni和Ni80Fe20纳米线生长的模板。我们的膜是通过高纯度铝箔的两步阳极氧化工艺获得的：首先在40 V，0.3 M草酸中，2-6°C的条件下进行15 h的阳极氧化;在相同条件下进行第二次阳极氧化30分钟，产生的孔长相似于1.3微米。在第二次阳极氧化之后，使孔底势垒层变薄，以使电流流过电子隧穿。然后使用脉冲电沉积方法来生长Ni和Ni80Fe20纳米线。给出了在产生的阵列上进行的传输表征和等温磁化测量。

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