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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Photoinduced changes in UV absorption spectra of nitrogen-doped silica caused by exposure to ArF excimer laser
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Photoinduced changes in UV absorption spectra of nitrogen-doped silica caused by exposure to ArF excimer laser

机译：暴露于ArF准分子激光引起的氮掺杂二氧化硅的紫外吸收光谱的光诱导变化

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摘要

Absorption spectra of high-purity silica, in which 1.2% or 3.0% oxygen atoms are replaced by nitrogen, are measured in the spectral interval of 3.0-6.5 eV. Photoinduced changes of these spectra when exposed to 193 nm wavelength excimer laser radiation, pulse intensity being similar to 50 mJ/cm(2), are examined. Absorption spectra relaxation under subsequent annealing as well as changes brought about by saturation of glass with molecular hydrogen are studied. Parts of graded-index fiber similar to 1 mm in length and 200 mu m thick transverse slices of a fiber preform served as samples. It is found that exposure of fiber samples to laser irradiation brings about a significant decrease of initially more intense absorption band of Si-ODC in the region of 5.0 eV and an increase of initially less intense band centered at 5.8 eV at a time. In bulk samples correlation of these bands is opposite, photoinduced changes are less expressed against structureless absorption tail increase in the spectral interval of 3.0-6.5 eV. It is shown that subsequent 20 min 700 degrees C annealing leads to the relaxation of photoinduced changes in absorption spectra in bulk and fiber samples. By placing irradiated samples into molecular hydrogen atmosphere at room temperature absorption bands are suppressed and transparency at shorter wavelengths of UV region is increased. Data obtained is discussed in the context of photosensitivity of nitrogen-doped silica-core fibers, which serve a technological platform for thermoresistant in-fiber Bragg gratings fabrication.
机译：在3.0-6.5 eV的光谱区间内测量了高纯度二氧化硅的吸收光谱，其中1.2％或3.0％的氧原子被氮取代。当暴露于193 nm波长的准分子激光辐射时，这些光谱的光致变化得到了检查，脉冲强度类似于50 mJ / cm（2）。研究了随后退火过程中的吸收光谱弛豫以及玻璃中分子氢饱和引起的变化。渐变折射率纤维的部分长度约为1毫米，纤维预制棒的横向切片为200微米，用作样品。已经发现，将纤维样品暴露于激光辐照导致在5.0eV的区域中Si-ODC的最初更强的吸收带的显着降低，以及一次以5.8eV为中心的最初的不那么强的带的增加。在大块样品中，这些谱带的相关性相反，在3.0-6.5 eV的光谱区间中，相对于无结构的吸收尾巴增加，光诱导的变化较少表达。结果表明，随后的20分钟700摄氏度退火导致散装样品和纤维样品中吸收光谱的光诱导变化松弛。通过在室温下将辐照样品置于分子氢气氛中，抑制了吸收带，并提高了紫外线区域较短波长下的透明度。在掺氮硅芯纤维的光敏性的背景下讨论了获得的数据，这为耐热的光纤布拉格光栅制造提供了技术平台。

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