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Surface morphology of as-deposited and illuminated As-Se chalcogenide thin films

机译:沉积和照亮的As-Se硫族化物薄膜的表面形态

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摘要

The role of the composition and of the related changes of the structure in the formation of the surface of amorphous AsxSe1-x (0 < x < 0.5) layers before and after light treatment was investigated by direct measurements of the surface roughness at nanometer-scale and surface deformations at micrometer-scale under influence of illumination. It was established that the surface roughness of the films, deposited by vacuum thermal evaporation, decreased with increasing As content, especially in compositions 0.1 <= x <= 0.3, where the maximum light stimulated surface deformations (localized expansion) occurs. Both relate to the rigidity percolation range and the maximum photoplastic effects, which are not directly connected to the known photodarkening effect, since it is minimal for these compositions.
机译:通过直接测量纳米级表面粗糙度,研究了光处理之前和之后非晶态AsxSe1-x(0

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