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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Optical absorption in proton-irradiated vitreous silica and its dependence on irradiation conditions and annealing
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Optical absorption in proton-irradiated vitreous silica and its dependence on irradiation conditions and annealing

机译：质子辐照的石英玻璃中的光吸收及其对辐照条件和退火的依赖性

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Vitreous SiO2 was irradiated with 9.2 MeV protons to dose levels of 5 x 10(22) p/m(2). Optical absorption in the region 4.1-8.2 eV (300-150 nm) was studied after irradiation at 220-600 degrees C and after subsequent isochronal annealing to 800 degrees C. Irradiation temperature and annealing had about the same effect on the irradiation induced absorption spectra. Spectra were dominated by irradiation induced absorption bands at 7.6 and 5.8 eV, while additional peaks around 6.9, 6.3 and possibly approximate to 5.0 eV were necessary to obtain good fits. The dependence of these peaks on irradiation and annealing temperature was analyzed. A comparison to previous results from irradiations with other particles indicated that the 7.6 and 6.9 eV bands can be assigned to defects produced preferentially by displacive cascade damage, while the 5.8 eV band, and probably 6.3 and 5.0 eV bands are produced preferentially by ionization effects. Irradiation induced plastic strains which were simultaneously measured showed no recovery during annealing. (C) 1997 Elsevier Science B.V.
机译：用9.2 MeV质子辐照玻璃SiO2，使其剂量水平为5 x 10（22）p / m（2）。在220-600摄氏度下辐照以及随后等时退火至800摄氏度之后，研究了4.1-8.2 eV（300-150 nm）区域的光吸收。辐照温度和退火对辐照诱导的吸收光谱具有大致相同的影响。光谱主要受辐射诱发的7.6和5.8 eV吸收带的支配，而要获得良好的拟合度，还需要在6.9、6.3附近以及可能接近5.0 eV的其他峰。分析了这些峰对辐照和退火温度的依赖性。与其他粒子辐照的先前结果的比较表明，可以将7.6和6.9 eV谱带归因于置换级联损伤优先产生的缺陷，而5.8 eV谱带以及可能由电离效应优先产生的6.3和5.0 eV谱带。同时测量的辐照引起的塑性应变在退火期间没有恢复。 （C）1997年Elsevier Science B.V.

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