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Amorphous silicon solar cells deposited at high growth rate

机译:以高生长速率沉积的非晶硅太阳能电池

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A series of investigations was performed to improve stabilized efficiency of hydrogenated amorphous silicon (a-Si:H) solar cells deposited at a high growth rate of 15-20 A/s by the plasma-enhanced chemical vapor deposition method. The deterioration of film stability accompanied by an increase of deposition rate was found to be closely correlated with the increase of Si-H, bond hydrogen content in the deposited film. Plasma diagnosis results by quadrupole mass spectrometry and optical emission spectroscopy showed that reduction of electron temperature of plasma can effectively suppress the formation of higher-order silane-related species in the plasma and can improve film stability. According to the guiding principles deduced from the plasma diagnosis, we successfully improved the stability of cell performance and obtained a considerably improved stabilized efficiency of 8.2% at a high rate of 20 Angstrom/s. Key issues for improving stabilized efficiency of high growth-rate a-Si:H solar cells. by making the best use of plasma diagnostic techniques, are presented and discussed. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 13]
机译:进行了一系列研究,以提高通过等离子体增强化学气相沉积法以15-20 A / s的高生长速度沉积的氢化非晶硅(a-Si:H)太阳能电池的稳定效率。发现伴随沉积速率增加的膜稳定性劣化与沉积膜中Si-H键氢含量的增加密切相关。通过四极质谱和光发射光谱法进行的等离子体诊断结果表明,降低等离子体的电子温度可以有效地抑制等离子体中高阶硅烷相关物质的形成,并可以改善薄膜稳定性。根据从血浆诊断得出的指导原则,我们成功地提高了电池性能的稳定性,并以20埃/秒的高速率获得了8.2%的大幅提高的稳定效率。改善高生长速率a-Si:H太阳能电池稳定效率的关键问题。通过充分利用血浆诊断技术,进行了介绍和讨论。 (C)2002 Elsevier Science B.V.保留所有权利。 [参考:13]

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