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Transport properties of hot-wire CVD mu c-Si : H layers for solar cells

机译:太阳能电池用热线CVD mu c-Si:H层的传输特性

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Transport properties of microcrystalline silicon (pc-Si:H) films prepared by hot-wire/catalytic chemical vapor deposition (HWCVD) have been investigated by steady-state photocarrier grating (SSPG) and conductivity measurements. Improved diffusion length has been obtained when the hydrogen dilution approaches the value corresponding to the amorphous-microcrystalline phase transition. i.e. 0.92 +/- 0.01. An efficiency of 5.1% has been obtained for muc-Si:H n-i-p superstrate type solar cells on a glass substrate, with a 3.5 mum thick i-layer deposited by HWCVD, using a variable hydrogen dilution (VHD) process with the final dilution value close to 0.92. Future use of a n-i-p substrate structure should improve the performance of HWCVD muc-Si:H solar cells. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 13]
机译:已经通过稳态光载流子光栅(SSPG)和电导率测量研究了通过热线/催化化学气相沉积(HWCVD)制备的微晶硅(pc-Si:H)薄膜的传输特性。当氢稀释达到对应于非晶-微晶相变的值时,获得了改善的扩散长度。即0.92 +/- 0.01。对于玻璃基板上的muc-Si:H nip压合上层型太阳能电池,采用可变氢稀释(VHD)工艺并通过最终稀释值,通过HWCVD沉积了3.5微米厚的i层,获得了5.1%的效率。接近0.92。将来使用n-i-p衬底结构应该可以改善HWCVD muc-Si:H太阳能电池的性能。 (C)2002 Elsevier Science B.V.保留所有权利。 [参考:13]

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