Excimer laser treatment for large surface

Stehle M

首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Excimer laser treatment for large surface

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Excimer laser treatment for large surface

机译：大表面准分子激光处理

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Historical background and present status of excimer laser annealing of amorphous silicon for poly-TFTs fabrication are presented. Scanning and single shot systems are compared both on the physical and economical aspects. Process optimization and process control using real time spectroscopic ellipsometry are also presented. Finally, some perspectives in the development of very high power excimer laser are also given. (C) 1997 Elsevier Science B.V.

机译：介绍了多晶硅薄膜制造中非晶硅的准分子激光退火的历史背景和现状。在物理和经济方面都对扫描和单发系统进行了比较。还介绍了使用实时光谱椭偏仪进行的过程优化和过程控制。最后，给出了发展超高功率准分子激光器的一些观点。（C）1997年Elsevier Science B.V.

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《Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites》 |1997年第0期|共5页
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Stehle M;
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中图分类晶体学;
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Excimer laser treatment for large surface

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