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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Morphology of electrochemically grown silver deposits on silver-saturated Ge-Se thin films
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Morphology of electrochemically grown silver deposits on silver-saturated Ge-Se thin films

机译：在银饱和的Ge-Se薄膜上电化学生长的银沉积物的形貌

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The morphology of electrochemically grown Ag deposits on the surface of silver-saturated Ge-Se thin films of different composition is investigated using atomic force microscopy. It is shown that the morphology and the growth rate are closely related to the composition of the Ge-Se host on which the growth is developed. The main reasons for this are the structure of the host and the nature of its electrical conductivity, both being dependent on the amount and distribution of the incorporated silver. The form of the clectrodeposits is important for the functionality of optical devices that use them to block or reflect light. (C) 2003 Elsevier B.V. All rights reserved. [References: 14]
机译：使用原子力显微镜研究了在不同组成的银饱和Ge-Se薄膜表面上电化学生长的Ag沉积物的形貌。结果表明，形貌和生长速率与生长在其上的Ge-Se基质的组成密切相关。造成这种现象的主要原因是基质的结构及其电导率的性质，两者均取决于所结合的银的量和分布。电沉积的形式对于使用它们来阻挡或反射光的光学装置的功能很重要。 （C）2003 Elsevier B.V.保留所有权利。 [参考：14]

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