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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Interface modification of ultrathin SiO2/Si(001) by nitric oxide treatments: a comparative electron paramagnetic resonance and nuclear reaction analysis study
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Interface modification of ultrathin SiO2/Si(001) by nitric oxide treatments: a comparative electron paramagnetic resonance and nuclear reaction analysis study

机译：一氧化氮处理对超薄SiO2 / Si（001）的界面改性：比较电子顺磁共振和核反应分析研究

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In this work, we investigate by nuclear reaction analysis (NRA), electron paramagnetic resonance (EPR) spectroscopy and atomic force microscopy (AFM) the NO-induced modifications of the physical properties of oxide layers of thickness <3 nm, obtained by rapid thermal oxidation (RTO) of Si in O-2 or O-2/O-3 mixture. We show that for both types of oxides, the N incorporation kinetics are faster than in the case of thick oxides (>20 nm), and typical concentration of 2 x 10(15) cm(-2) call be achieved. The N profiles varies with oxide type. In both cases, the interface defect concentration is reduced after furnace NO treatments by up to a factor of six. Our study reveals that this reduction is not only the consequence of the N incorporation but that the thermal relaxation of the nitrided layer also plays a major role. To investigate this effect, we performed He annealings which change the thermal budget of the dielectric layer. We show that the He annealings of the NO treated layers delays the re-oxidation process further and changes the chemical composition of the nitrided oxide layer. By AFM, we show that the NO treatment does not form a continuous nitrided layer but forms islands at the interface. (C) 2001 Elsevier Science B.V. All rights reserved. [References: 13]
机译：在这项工作中，我们通过核反应分析（NRA），电子顺磁共振（EPR）光谱和原子力显微镜（AFM）研究了NO诱导的通过快速热作用获得的厚度小于3 nm的氧化物层的物理性质的改性。 O-2或O-2 / O-3混合物中Si的氧化（RTO）。我们表明，对于两种类型的氧化物，氮的掺入动力学都比厚氧化物（> 20 nm）的情况要快，典型的浓度为2 x 10（15）cm（-2）。 N分布随氧化物类型而变化。在这两种情况下，炉子NO处理后的界面缺陷浓度最多降低了六倍。我们的研究表明，这种还原不仅是氮结合的结果，而且氮化层的热弛豫也起着主要作用。为了研究这种影响，我们进行了He退火，以改变介电层的热收支。我们表明，NO处理层的He退火进一步延迟了再氧化过程，并改变了氮化氧化物层的化学成分。通过原子力显微镜，我们表明，NO处理不会形成连续的氮化层，而是在界面处形成岛。 （C）2001 Elsevier Science B.V.保留所有权利。 [参考：13]

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