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首页> 外文期刊>Journal of Microlithography, Microfabrication, and Microsystems. (JM3) >Fabrication and measurement of wideband achromatic waveplates for the mid-infrared region using subwavelength features
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Fabrication and measurement of wideband achromatic waveplates for the mid-infrared region using subwavelength features

机译：利用亚波长特征制造和测量用于中红外区域的宽带消色差波片

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摘要

Subwavelength diffractive features etched into a substrate lead to form birefringence that can produce polarization sensitive elements such as wave plates. Using etched features allows for the development of pixelated devices to be used in conjunction with focal plane arrays in polarimetric imaging systems. Form birefringence exhibits dispersion that can be advantageous to the design of wave plates with an achromatic response. Taking advantage of this dispersion, diffractive wave plates with good achromatic characteristics can be designed for the 2- to 5-μm spectral region. Previous work in this area has produced good results over a subset of this wavelength band, but designing for this extended band is particularly challenging. The fabrication processes for the subwavelength features will be discussed and fabricated devices with a measured average phase retardation of 80.6 deg and rms variation of 9.41 deg will be presented.
机译：蚀刻到衬底中的亚波长衍射特征导致形成双折射，该双折射可产生偏振敏感元件，例如波片。使用蚀刻特征允许开发像素化设备，以与偏振成像系统中的焦平面阵列结合使用。形式双折射表现出色散，这对于具有消色差响应的波片设计可能是有利的。利用这种色散，可以为2至5μm的光谱区域设计具有良好消色差特性的衍射波片。在该领域的先前工作已经在该波长带的一个子集上产生了良好的结果，但是为该扩展带进行设计特别具有挑战性。将讨论亚波长特征的制造过程，并将提供制造的器件，其测量的平均相位延迟为80.6度，均方根变化为9.41度。

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