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首页> 外文期刊>Journal of Micromechanics and Microengineering >SU-8 Ka-band filter and its microfabrication
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SU-8 Ka-band filter and its microfabrication

机译:SU-8 Ka波段滤波器及其微制造

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This paper presents the design and microfabrication of a coaxial dual model filter for applications in LMDS systems. The coaxial structure is formed by five conductive layers, each of which is of 700 Am thickness. The filter uses an air filled coaxial transmission line. It is compact with low dispersion and low loss. The design has been extensively tested using a prototype filter micromachined using laser drilling on a copper sheet and the results show a good agreement with the theoretical calculations. The laser fabrication has exposed weakness in suitability to volume production, uneven edges and oxide residuals on the edges, which affects the filter performance. A process for fabrication of such a filter in SU-8 has been developed which is based on a UV lithographical process. In order to fabricate such thick SU-8 layers, the SU-8 process has been optimized in terms of UV radiation and post exposure baking. During the test fabrication, the optimized SU-8 process has produced microstructures with an aspect ratio of 40:1 and a sidewall of 90 +/- 0.1 degrees. The high quality SU-8 structures can be then either coated with a conductive metal or used as moulds for producing copper structures using an electroforming process. The microfabrication process presented in this paper suits the proposed filter well. It also reveals a good potential for volume production of high quality RF devices.
机译:本文介绍了用于LMDS系统的同轴双模滤波器的设计和微制造。同轴结构由五个导电层形成,每个导电层的厚度为700 Am。过滤器使用充气同轴传输线。它是紧凑的,具有低分散性和低损耗。该设计已通过使用在铜片上进行激光钻孔的微加工原型过滤器进行了广泛的测试,结果表明与理论计算具有很好的一致性。激光制造在适应批量生产,边缘不平整和边缘上的氧化物残留等方面存在弱点,这会影响滤波器的性能。已经开发了基于UV光刻工艺的SU-8中这种滤光器的制造方法。为了制造这种厚的SU-8层,在紫外线辐射和曝光后烘烤方面对SU-8工艺进行了优化。在测试过程中,经过优化的SU-8工艺生产出的微结构的纵横比为40:1,侧壁为90 +/- 0.1度。然后可以使用导电金属涂覆高质量的SU-8结构,或将其用作使用电铸工艺生产铜结构的模具。本文介绍的微细加工工艺非常适合所提出的过滤器。它还显示出了批量生产高质量RF设备的良好潜力。

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