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Fine and high-aspect-ratio screen printing combined with an imprinting technique

机译:精细和高纵横比的丝网印刷结合压印技术

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The development of screen-priming techniques in order to obtain tine patterns with a high aspect ratio is an important task in the advancement of printed electronics. To this end, we propose a new printing concept in this study that consists of a combination of the screen printing process with an imprinting technique. We show that tine and high-aspect-ratio patterns are realized by the capillary force of parallel-walled structures (PWSs) on the material to be printed. The PWS is fabricated by an imprinting method using an ultra-violet curable resin. In order to obtain finer patterns with a higher aspect ratio, printed patterns according to the pitch and the height of the PWSs were assessed, A printed pattern with a line width of 6.3 pm was obtained at a PWS, with a pitch of 20 pm and at a height of 110 pm, when a screen mask with a 100 pm-wide resist opening was used. The line width of the printed patterns was well controlled by the pitch of the PWSs. Moreover, an aspect ratio of up to 7.4 was achieved. Furthermore, we expect this screen -printing process to implement submicron patterns as well as more complex patterns, including curves and rings, through well-designed microstructures.
机译:为了获得具有高纵横比的齿形图案的屏幕灌注技术的发展是印刷电子学发展的重要任务。为此,我们在这项研究中提出了一种新的印刷概念,其中包括丝网印刷工艺和压印技术的结合。我们显示,通过在要打印的材料上使用平行壁结构(PWSs)的毛细作用力,可以实现尖齿和高纵横比的图案。通过使用紫外线可固化树脂的压印方法来制造PWS。为了获得具有更高纵横比的更精细图案,根据PWS的间距和高度评估了印刷图案,在PWS上获得了线宽为6.3 pm的印刷图案,间距为20 pm,当使用高度为100 pm的抗蚀剂开口的屏幕掩膜时,在110 pm的高度下。通过PWS的间距可以很好地控制印刷图案的线宽。此外,实现了高达7.4的纵横比。此外,我们希望这种丝网印刷工艺能够通过精心设计的微结构实现亚微米图案以及更复杂的图案,包括曲线和圆环。

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