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首页> 外文期刊>Journal of Micromechanics and Microengineering >Simulation of ion beam induced microano fabrication
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Simulation of ion beam induced microano fabrication

机译：离子束诱导的微/纳米加工的仿真

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摘要

The shrinking critical dimensions of modern technology place heavy requirements on optimizing feature shapes at the micro and nano scale. Ion beams are increasingly used for technology development in the nano- scale world. In recent years, many approaches and research results have indicated that re- deposition of sputtered target atoms is the most serious problem in fabricating micro and nano devices. A simulation tool is essential to reduce unnecessary time and efforts spent in process development. In this paper, we present two- dimensional string- based simulation software for ion milling and focused ion beam direct fabrication, AMADEUS- 2D ( advanced modeling and design environment for sputter processes). We discuss the numerical model for considering sputtering and re- deposition fluxes. In addition, we investigate sputtering yield and sputtered atom distributions as obtained from several binary collision simulation codes. The newly developed simulation code is validated by comparison with experimental data on single- pixel hole milling, on the width and dose dependence of trench formation and on the effective sputtering yield as a function of scan speed.
机译：现代技术不断缩小的关键尺寸对在微米和纳米尺度上优化特征形状提出了严格的要求。离子束在纳米世界中越来越多地用于技术开发。近年来，许多方法和研究结果表明，溅射靶原子的再沉积是制造微米和纳米器件中最严重的问题。仿真工具对于减少过程开发中不必要的时间和精力至关重要。在本文中，我们介绍了用于离子铣削和聚焦离子束直接制造的二维基于字符串的仿真软件AMADEUS-2D（用于溅射工艺的高级建模和设计环境）。我们讨论了考虑溅射和再沉积通量的数值模型。此外，我们研究了从几个二进制碰撞模拟代码获得的溅射产率和溅射原子分布。通过与单像素孔铣削，沟槽形成的宽度和剂量依赖性以及有效溅射产量与扫描速度的函数的实验数据进行比较，验证了新开发的仿真代码。

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