Patterned thick photoresist layers for protection of protruding structures during wet and dry etching processes

Indermuhle PF.; Dellmann L.; de Rooij NF.; Roth S.

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Patterned thick photoresist layers for protection of protruding structures during wet and dry etching processes

机译：图案化的厚光致抗蚀剂层，用于在湿法和干法蚀刻过程中保护突出结构

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Thick photoresist (about 40 mu m) was patterned and used as a protective layer for protruding structures (sharp, high aspect ratio atomic force microscope tips) in wet (buffered hydrofluoric acid) and dry (reactive ion etching) etching. The process and results of its use are discussed, and some applications are proposed. [References: 8]

机译：对厚的光刻胶（约40微米）进行构图，并用作湿法（缓冲氢氟酸）和干法（反应离子刻蚀）刻蚀中凸出结构（锋利的高纵横比原子力显微镜尖端）的保护层。讨论了其使用过程和结果，并提出了一些应用。 [参考：8]

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《Journal of Micromechanics and Microengineering》 |1998年第2期|共3页
作者
Indermuhle PF.; Dellmann L.; de Rooij NF.; Roth S.;
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正文语种 eng
中图分类仪器、仪表;
关键词
Scanning force microscopy; Sensors;

机译：扫描力显微镜;传感器;

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专利

1. Patterned thick photoresist layers for protection of protruding structures during wet and dry etching processes [J] . Indermuhle PF., Dellmann L., de Rooij NF., Journal of Micromechanics and Microengineering . 1998,第2期

机译：图案化的厚光致抗蚀剂层，用于在湿法和干法蚀刻过程中保护突出结构
2. Fabrication of glass-based microfluidic devices with dry film photoresists as pattern transfer masks for wet etching [J] . Zhang Lei, Wang Wei, Ju Xiao-Jie, RSC Advances . 2015,第8期

机译：用干膜光致抗蚀剂作为用于湿法蚀刻的图案转移掩模的玻璃基微流体器件的制造
3. Cathodic protection of buried steel structures: Processes occurring at the steel/soil interface during wet/dry cycles [J] . Mahlobo Mandlenkosi G. R., Olubambi Peter A., Jeannin Marc, Materials and Corrosion . 2020,第3期

机译：埋藏钢结构的阴极保护：在湿/干循环期间在钢/土界面发生的过程
4. Fabrication of photonic crystal structure in fluorine-doped silicon dioxide film by dry and wet etching processes [C] . Kenji Kintaka, Junji Nishii Conference on Lasers and Electro-Optics Europe . 2000

机译：用干燥蚀刻工艺制造氟掺杂二氧化硅膜的光子晶体结构
5. In-situ control and monitoring of wet and dry etching of patterned semiconductors using real time spectroscopic ellipsometry. [D] . Cho, Sang-Jun. 2002

机译：使用实时光谱椭圆偏振法原位控制和监视图案化半导体的干法和湿法蚀刻。
6. Anti-reflectance investigation of a micro-nano hybrid structure fabricated by dry/wet etching methods [O] . Xiao Tan, Zhi Tao, Mingxing Yu, -1

机译：干/湿蚀刻法制备的微纳米杂化结构的减反射研究
7. Direct Visualization of Solution-based Nanofabrication Processes with In Situ TEM: Chemical Wet-etching and Solution-based Cleaning/Drying of High-Aspect-Ratio Nanostructures [O] . Utkur Mirsaidov, Zainul Aabdin, Tanmay Ghosh, 2018

机译：用原位TEM直接可视化基于溶液的纳米制作方法：化学湿法蚀刻和基于溶液的高纵横比纳米结构的清洁/干燥

Patterned thick photoresist layers for protection of protruding structures during wet and dry etching processes

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