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首页> 外文期刊>Journal of Micromechanics and Microengineering >Experimental analysis of the surface roughness evolution of etched glass for microanofluidic devices
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Experimental analysis of the surface roughness evolution of etched glass for microanofluidic devices

机译：微/纳流体器件刻蚀玻璃表面粗糙度演变的实验分析

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摘要

Roughness of channel surfaces, both deterministic and random, is known to affect the fluid flow behavior in microanoscale fluidic devices. This has relevance particularly for applications involving non-Newtonian fluids, such as in biomedical lab-on-chip devices. While several studies have investigated effects of relative large, deterministic surface structures on fluid flow, the effect of random roughness on microfluidic flow remains relatively unexplored. In this study, the effects of processing conditions for wet etching of glass including etching time and etching orientation on centre-line average (Ra) and the autocorrelation length (ACL) were investigated. Statistical distribution of the roughness was also studied. Results indicated that ACL can be tailored in the range of 1-4μm by changing etching time in horizontal etching while Ra was found to increase weakly with etching time in all three etching orientations. Analysis of the experimental data using the Kolmogorov-Smirnov goodness-of-fit hypothesis test shows that the glass surface roughness does not follow a Gaussian distribution, as is typically assumed in the literature. Instead, the T location-scale distribution fits the roughness data with 1.11% error. These results provide promising insights into tailoring surface roughness for improving microfiuidic devices.
机译：已知通道表面的粗糙度（确定性和随机性）都会影响微/纳米级流体装置中的流体流动行为。这特别适用于涉及非牛顿流体的应用，例如生物医学芯片实验室设备。尽管有几项研究调查了相对较大的确定性表面结构对流体流动的影响，但相对粗糙度对微流体流动的影响仍未得到充分研究。在这项研究中，研究了湿法刻蚀玻璃的工艺条件（包括刻蚀时间和刻蚀方向）对中心线平均值（Ra）和自相关长度（ACL）的影响。还研究了粗糙度的统计分布。结果表明，通过改变水平刻蚀的刻蚀时间，可以在1-4μm的范围内调整ACL，而在所有三个刻蚀方向上，Ra随刻蚀时间的增加而变弱。使用Kolmogorov-Smirnov拟合优度假设检验对实验数据进行分析，结果表明，玻璃表面粗糙度不遵循高斯分布，正如文献中通常假定的那样。取而代之的是，T位置尺度分布以1.11％的误差拟合粗糙度数据。这些结果为定制表面粗糙度以改善微流体装置提供了有前途的见识。

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