Iridium oxide deposited by pulsed dc-sputtering for stimulation electrodes

A. van Ooyen; G. Topalov; G. Ganske; W. Mokwa; U. Schnakenberg

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Iridium oxide deposited by pulsed dc-sputtering for stimulation electrodes

机译：通过脉冲直流溅射沉积刺激电极上的氧化铱

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A pulsed-dc reactive sputtering technique was used for iridium oxide thin-film deposition. Pulsing frequency and oxygen flow were varied over several deposition cycles, regarding stimulation electrode applications. Surface and electrochemical analysis were performed for deposition evaluation. The results show the influence of the oxygen flow to the morphology and the electrochemical properties of the reactively sputtered films. Optimal surface structure and electrochemical properties for films deposited at 0.016 mbar working pressure, 100 kHz pulse frequency and 1μs pulsewidth can be achieved at oxygen flows around 8 to 10 sccm.

机译：脉冲直流反应溅射技术用于氧化铱薄膜的沉积。关于刺激电极的应用，脉冲频率和氧气流量在几个沉积周期内变化。进行表面和电化学分析以进行沉积评估。结果表明氧气流量对反应溅射膜的形貌和电化学性能的影响。在氧气流量为8至10 sccm的情况下，在0.016 mbar工作压力，100 kHz脉冲频率和1μs脉冲宽度下沉积的薄膜可获得最佳的表面结构和电化学性能。

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《Journal of Micromechanics and Microengineering》 |2009年第7期|共6页
作者
A. van Ooyen; G. Topalov; G. Ganske; W. Mokwa; U. Schnakenberg;
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1. Iridium oxide deposited by pulsed dc-sputtering for stimulation electrodes [J] . A. van Ooyen, G. Topalov, G. Ganske, Journal of Micromechanics and Microengineering . 2009,第7期

机译：通过脉冲直流溅射沉积刺激电极上的氧化铱
2. Electrochemically deposited iridium oxide reference electrode integrated with an electroenzymatic glutamate sensor on a multi-electrode array microprobe [J] . Tolosa V.M., Wassum K.M., Maidment N.T., Biosensors & Bioelectronics: The International Journal for the Professional Involved with Research, Technology and Applications of Biosensers and Related Devices . 2013,第Null期

机译：在多电极阵列微探针上与电化学谷氨酸传感器集成的电化学沉积氧化铱参比电极
3. Factors limiting doping efficiency of Iridium in pulsed laser deposited TiO2 transparent conducting oxide [J] . Slonopas Andre, Melia Michael, Xie Kai, Journal of Materials Science . 2016,第19期

机译：限制铱在脉冲激光沉积TiO2透明导电氧化物中掺杂效率的因素
4. A COMPARISON OF TiN, IRIDIUM AND IRIDIUM OXIDE STIMULATING ELECTRODES FOR NEURAL STIMULATION [C] . Naser Pour Aryan, Christian Brendler, Viola Rieger, Biomedical engineering . 2012

机译：用于神经刺激的TiN，铱和氧化铱激发电极的比较
5. Development of Iridium-Bismuth-Oxide Coatings for Use in Neural Stimulating Electrodes [D] . Xu, Xingge. 2019

机译：用于神经刺激电极的铱 - 铋氧化物涂料的研制
6. Neural Electrode Degradation from Continuous Electrical Stimulation: Comparison of Sputtered and Activated Iridium Oxide [O] . Sandeep Negi, Rajmohan Bhandari, Loren Rieth, -1

机译：从连续电刺激的神经电极降解：溅射和活化铱氧化物的比较
7. High‐charge‐capacity sputtered iridium oxide neural stimulation electrodes deposited using water vapor as a reactive plasma constituent [O] . Jimin Maeng, Bitan Chakraborty, Negar Geramifard, 2019

机译：使用水蒸气作为反应性等离子体成分，沉积的高电荷 - 容量溅射铱涂覆的神经刺激电极
8. Unexpected Redox Rectification by an Electrochemically Prepared Iridium Oxide Electrode/Aqueous Acid Interface. [R] . Johnson, C. S., Hupp, J. T. 1992

机译：通过电化学制备的氧化铱电极/水性酸界面进行意外的氧化还原精馏。

Iridium oxide deposited by pulsed dc-sputtering for stimulation electrodes

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