首页> 外文期刊>Journal of Nuclear Materials: Materials Aspects of Fission and Fusion >CRYSTAL STRUCTURE OF THIN OXIDE FILMS GROWN ON ZR-NB ALLOYS STUDIED BY RHEED
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CRYSTAL STRUCTURE OF THIN OXIDE FILMS GROWN ON ZR-NB ALLOYS STUDIED BY RHEED

机译:RHEED研究ZR-NB合金上生长的氧化物薄膜的晶体结构

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The highly surface sensitive reflection high energy electron diffraction (RHEED) technique was used to determine the crystal structure of oxide films grown on Zr-Nb alloys in air up to 673 K. The results show that the oxide films grown on Zr-2.5 wt% Nb (alpha-Zr + beta-Zr) have a mixture of nearly-cubic-tetragonal and monoclinic structures for films of 200 nm thick or less and that the outer layers of films thicker than 800 nm only have the monoclinic crystal structure. However, oxide films grown on Zr-20 wt% Nb (beta-Zr) have a stabilized nearly-cubic-tetragonal structure for all film thicknesses, studied here, up to 2100 nm. [References: 21]
机译:使用高表面灵敏度反射高能电子衍射(RHEED)技术确定在最高673 K的空气中在Zr-Nb合金上生长的氧化膜的晶体结构。结果表明,在Zr-2.5 wt%上生长的氧化膜Nb(α-Zr+β-Zr)具有近立方-四方和单斜晶结构的混合物,厚度为200 nm或更小,而厚于800 nm的膜的外层仅具有单斜晶结构。然而,在Zr-20 wt%Nb(β-Zr)上生长的氧化膜对于直至2100 nm的所有膜厚度都具有稳定的近立方-四边形结构。 [参考:21]

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