Erosion of a-C:H films deposited on W, Mo, and stainless steel under interaction with air glow discharge

Zalavutdinov R.Kh.; Gorodetsky A.E.; Bukhovets V.L.; Zakharov A.P.; Mazul I.V.

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Erosion of a-C:H films deposited on W, Mo, and stainless steel under interaction with air glow discharge

机译：在与空气辉光放电相互作用下沉积在W，Mo和不锈钢上的a-C：H膜的腐蚀

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An air direct current glow discharge with a hollow cathode was used as source of chemically active oxygen for selective removal of amorphous hydrogenated (a-C:H) films deposited on W, Mo, and stainless steel. The films were removed both directly in the discharge and afterglow region. The film erosion rates depend on the sample position relatively to plasma and decrease in the order: hollow cathode, positive column, afterglow region. It was shown that primary (1-3 nm) continuous amorphous and secondary (1-30 nm) island-like oxide films were formed on the metal surfaces after removal of the a-C:H films. Polycrystalline island-like oxide films were generated due to recrystallization of the primary films. Material oxidation suppression was caused by reactions of oxygen ion neutralization and atomic oxygen recombination on metals.

机译：具有空心阴极的空气直流辉光放电用作化学活性氧的来源，用于选择性去除沉积在W，Mo和不锈钢上的非晶态氢化（a-C：H）膜。在放电区和余辉区都直接去除了薄膜。薄膜腐蚀速率取决于样品相对于等离子体的位置，并依次降低：空心阴极，正极柱，余辉区。结果表明，在去除a-C：H膜后，在金属表面形成了一层（1-3 nm）连续的非晶态和一层（1-30 nm）岛状的氧化膜。由于初级膜的再结晶，产生了多晶岛状氧化物膜。物质的氧化抑制是由金属上的氧离子中和和原子氧重组反应引起的。

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《Journal of Nuclear Materials: Materials Aspects of Fission and Fusion》 |2011年第1suppla期|共4页
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Zalavutdinov R.Kh.; Gorodetsky A.E.; Bukhovets V.L.; Zakharov A.P.; Mazul I.V.;
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1. Erosion of a-C:H films deposited on W, Mo, and stainless steel under interaction with air glow discharge [J] . Zalavutdinov R.Kh., Gorodetsky A.E., Bukhovets V.L., Journal of Nuclear Materials: Materials Aspects of Fission and Fusion . 2011,第1Suppla期

机译：在与空气辉光放电相互作用下沉积在W，Mo和不锈钢上的a-C：H膜的腐蚀
2. Comparative study of the effect of thermal annealing on the hydrogen stability and the stress in a-C : H films deposited by electron cyclotron resonance glow discharge and direct current multipolar plasma methods [J] . Benlahsen M., Clin M., Zellama K., Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2000,第Pta2期

机译：电子回旋共振辉光放电和直流多极等离子体方法热退火对a-C：H薄膜氢稳定性和应力影响的比较研究
3. Surface and Interface Analysis of Oxide films on Sputtered Stainless Steel by Glow Discharge Optical Emission Spectroscopy (GDOES) and Conversion electron Mossbauer spectroscopy (CEMS) [J] . Kiyoshi Nomura, Kenichi Shimizu 材料とプロセス: 日本鉄鋼協会講演論文集 . 2003,第3期

机译：辉光放电光谱法（GDOES）和转化电子Mossbauer光谱仪（CEMS）分析溅射不锈钢表面氧化膜的表面和界面
4. Improvement of the cavitation erosion resistance for Cr3Si film on stainless steel by double cathode glow discharge [C] . Hongqin Ding, Yujiang Qiu International Conference on Mining, Materials and Metallurgical Engineering . 2017

机译：通过双阴极辉光放电改善CR3SI膜对CR3SI薄膜的空化蚀阻
5. Effect of glow discharge on laser-vaporized deposition of thin films and activation energy measurement of the copper-oxygen reaction in glow discharge. [D] . Zhang, Shuhua. 1993

机译：辉光放电对激光汽化沉积薄膜的影响以及辉光放电中铜-氧反应的活化能测量。
6. Spectroscopic Study of Plasma Polymerized a-C:H Films Deposited by a Dielectric Barrier Discharge [O] . Thejaswini Halethimmanahally Chandrashekaraiah, Robert Bogdanowicz, Eckart Rühl, 2016

机译：介电势垒放电沉积的等离子体聚合a-C：H薄膜的光谱研究
7. Distribution of Cobalt in Surface Oxide Film of Type 304 Stainless Steel Exposed to High-Temperature Water. Quantitative Analysis by Glow Discharge Optical Emission Spectrometry. [O] . Shoichi ONO, Masashi HAGINUMA, Mikio KUMAGAI, 1995

机译：304型不锈钢表面氧化膜中钴的分布，暴露于高温水。辉光放电光发射光谱法定量分析。
8. Nucleation and Growth of N- and P-Type Microcrystals in Low-Temperature Glow-Discharge Deposited Silicon Films [R] . Vanier, P. E., Tafto, J., Rajeswaran, G., 1984

机译：低温辉光放电硅薄膜中N-和p-型微晶的形核和生长

Erosion of a-C:H films deposited on W, Mo, and stainless steel under interaction with air glow discharge

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