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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Magnetic properties of nickel film formed under magnetic fields
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Magnetic properties of nickel film formed under magnetic fields

机译：磁场下形成的镍膜的磁性

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Nickel film deposited on a (1 0 0) oriented silicon substrate was prepared at 110 degrees C by a simple chemical method under the application of a 0.3 T magnetic field. The prepared film possesses a shiny- silver surface and a strong binding ability develops between the film and the silicon surface. FESEM images show that the thickness of the film prepared under the application of an external magnetic field is 1.35 mu m, which is thicker than that of the film synthesized without an external applied field: 0.80 mu m. Magnetic measurement indicates that saturation magnetization M-s and the coercivity H-c of the sample prepared with an external magnetic field are 495 emu cm(-3) and 65 Oe, which are higher than those of the other sample without a magnetic field applied (338 emu cm(-3) and 48 Oe, respectively). It is suggested that relatively ordered magnetic structures induced by magnetic fields during preparation result in the enhancement of magnetic properties.
机译：通过简单的化学方法在0.3 T磁场的作用下于110摄氏度制备沉积在（1 0 0）取向的硅基板上的镍膜。制备的膜具有闪亮的银表面，并且在膜和硅表面之间形成了很强的结合能力。 FESEM图像显示，在施加外部磁场的情况下制备的膜的厚度为1.35μm，比没有外部施加磁场的情况下合成的膜的厚度为0.80μm。磁性测量表明，使用外部磁场制备的样品的饱和磁化强度Ms和矫顽力Hc分别为495 emu cm（-3）和65 Oe，高于未施加磁场的其他样品的饱和磁化强度Ms和矫顽力Hc（338 emu cm （-3）和48 Oe）。建议在制备期间由磁场感应的相对有序的磁性结构导致磁性的增强。

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