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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Characteristics of high reflection mirror with an SiO2 top layer for multilayer dielectric grating
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Characteristics of high reflection mirror with an SiO2 top layer for multilayer dielectric grating

机译:多层介质光栅用SiO2顶层高反射镜的特性

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摘要

The high reflection (HR) mirror composed of dielectric stacks with excellent spectrum characteristics and high damage resistant ability is critical for fabricating multilayer dielectric (MLD) grating for pulse compressor. The selection of the SiO2 material as the top layer of the HR mirror for grating fabrication is beneficial for improving the laser-induced damage threshold of MLD grating as well as minimizing the standing-wave effect in the photoresist during the exposure process. Based on an (HLL) H-9 design comprising quarter-waves of HfO2 ( H) and half-waves of SiO2 ( L), we obtain an optimal design of the HR mirror for MLD grating, the SiO2 top layer of which is optimized with a merit function including both the diffraction efficiency of the MLD grating and the electric field enhancement in the grating. Dependence of the performance of the MLD grating on the fabrication error of the dielectric mirror is analysed in detail. The HR mirror is also fabricated by E-beam evaporation, which shows good spectral characteristics at the exposure wavelength of 413 nm and at the operation wavelength of 1053 nm and an average damage threshold of 10 J cm(-2) for a 12 ns pulse.
机译:由具有优异光谱特性和高抗损伤能力的电介质叠层组成的高反射(HR)镜对于制造用于脉冲压缩器的多层电介质(MLD)光栅至关重要。选择SiO2材料作为用于光栅制造的HR反射镜的顶层,有利于提高激光诱导的MLD光栅的损伤阈值,并使曝光过程中光刻胶中的驻波效应最小化。基于(HLL)H-9设计,其中包括四分之一的HfO2(H)和SiO2(L)的半波,我们获得了用于MLD光栅的HR镜的最佳设计,其SiO2顶层已优化具有包括MLD光栅的衍射效率和光栅中的电场增强的优点函数。详细分析了MLD光栅的性能对介电镜制造误差的依赖性。 HR镜也是通过电子束蒸发制造的,对于12 ns脉冲,它在413 nm的曝光波长和1053 nm的工作波长下显示出良好的光谱特性,并且平均损伤阈值为10 J cm(-2) 。

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