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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Reactively evaporated multilayer antireflection coatings for Ge optical window
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Reactively evaporated multilayer antireflection coatings for Ge optical window

机译：反应性蒸发的Ge光学窗多层防反射膜

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摘要

Two multilayer antireflection (AR) coating configurations are designed, prepared and characterized. These AR coatings are designed for a 1 mm thick Ge optical window in the 3.25-5.25 mu m band. Ta2O5 and TiO2 are used as high index materials along with SiO2 as low index material. Configuration 1 comprises nine alternating layers of SiO2 and Ta2O5, whereas configuration 2 comprises seven alternating layers of SiO2 and TiO2. Post-deposition annealing is also carried out in the temperature range 150-450 degrees C for 10 h. The prepared multilayered structures are characterized optically and structurally using a spectrophotometer, an atomic force microscope, x-ray diffraction and a scanning electron microscope. Optical characterization shows that multilayered structures have high absorption for as- deposited samples. A considerable improvement in the transmission profiles for the two multilayered configurations is observed at 350 degrees C with peak and average transmission for both the configurations exceeding 90%. The as- prepared samples show predominantly amorphous- like structure with pronounced peaks for configuration 2 only. Delamination (for configuration 1) and cracking (for configuration 2) of the multilayered structures are witnessed at an annealing temperature of 450 degrees C.
机译：设计，准备和表征了两种多层抗反射（AR）涂层配置。这些增透膜设计用于厚度为3.25-5.25微米的1毫米厚的锗光学窗口。 Ta2O5和TiO2用作高折射率材料，而SiO2用作低折射率材料。配置1包括九个交替的SiO 2和Ta 2 O 5层，而配置2包括七个交替的SiO 2和TiO 2层。沉积后退火也在温度范围150-450摄氏度下进行10小时。使用分光光度计，原子力显微镜，X射线衍射和扫描电子显微镜对制备的多层结构进行光学和结构表征。光学表征表明，多层结构对沉积的样品具有高吸收率。在350℃下观察到两种多层结构的透射曲线有相当大的改善，两种结构的峰值和平均透射率均超过90％。所制备的样品显示出主要为无定形的结构，仅对于构型2具有明显的峰。在450℃的退火温度下观察到多层结构的分层（对于配置1）和破裂（对于配置2）。

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