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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >The effects of pulsed substrate biasing on thin amorphous carbon coatings: a statistical design of experiment study
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The effects of pulsed substrate biasing on thin amorphous carbon coatings: a statistical design of experiment study

机译：脉冲基板偏压对薄无定形碳涂层的影响：实验研究的统计设计

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A statistical design of experiment ( DOE) was used to investigate the effects of medium frequency pulsed substrate bias voltage, pulse frequency and pulse width on 150 nm sputtered C coatings doped with Cr. Within the scope of this work, the DOE treatment of nanoindentationanoscratch, atomic force microscopy and x-ray photoelectron spectroscopy results were shown to be a successful method for investigating and potentially optimizing very thin sputter ion plated coatings. Bias voltage was shown to be the most significant of the three bias factors for mechanical properties. Bias frequency and pulse width showed effects that partly matched the voltage results and this was discussed with regard to an increase in peak voltage accompanying an increase in frequency and pulse width. For surface topography, the results were more complicated with the significance of each parameter varying according to the property measured. This work also demonstrated the complex inter-relationships that exist between the three bias parameters, meaning that any attempt to optimize the pulse bias condition for a given coating property would require a consideration of all three factors ( within the available operating window of the pulse unit).
机译：统计实验设计（DOE）用于研究中频脉冲基板偏置电压，脉冲频率和脉冲宽度对掺Cr的150 nm溅射C涂层的影响。在这项工作的范围内，对纳米压痕/纳米划痕的DOE处理，原子力显微镜和X射线光电子能谱结果显示出是研究和潜在优化非常薄的溅射离子镀膜的成功方法。偏置电压被证明是机械性能的三个偏置因素中最重要的。偏置频率和脉冲宽度显示出与电压结果部分匹配的效果，并讨论了峰值电压随频率和脉冲宽度增加而增加的情况。对于表面形貌，结果会更加复杂，每个参数的重要性会根据所测量的属性而变化。这项工作还证明了三个偏置参数之间存在复杂的相互关系，这意味着针对给定涂层性能优化脉冲偏置条件的任何尝试都需要考虑所有三个因素（在脉冲单元的可用工作窗口内） ）。

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