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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Plasma backflow phenomenon in high-current vacuum arc
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Plasma backflow phenomenon in high-current vacuum arc

机译：大电流真空电弧中的等离子体回流现象

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摘要

Based on the two-temperature magnetohydrodynamic model, a high-current vacuum arc (HCVA) in vacuum interrupters is simulated and analysed. The phenomenon of plasma backflow in arc column is found, which is ultimately ascribed to the strong magnetic pinch effect of HCVA. Due to plasma backflow, the maximal value of ion density at the cathode side is not located at the centre of the cathode side, but at the paraxial region of the cathode side, that is to say, ion density appears to sag at the centre of the cathode side (arc column seems to be divided into two parts). The sag of light intensity is also found by experiments.
机译：基于两温磁流体动力学模型，对真空灭弧室中的大电流真空电弧（HCVA）进行了仿真和分析。发现电弧柱中存在等离子体回流现象，这最终归因于HCVA的强磁性收缩效应。由于等离子体的回流，在阴极侧的离子密度的最大值不在阴极侧的中心，而是在阴极侧的近轴区域，也就是说，离子密度在硅的中心凹陷。阴极侧（弧柱似乎分为两部分）。光强度的下垂也通过实验发现。

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