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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >The effect of roughness on the micromagnetic properties of high moment multilayer films
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The effect of roughness on the micromagnetic properties of high moment multilayer films

机译：粗糙度对高弯矩多层膜微磁性能的影响

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摘要

Electron microscopy has been used to determine directly the effect of artificially introduced roughness on the micromagnetic processes that occur in soft high moment multilayer films. The nanodefects, introduced to roughen the substrate, and the local magnetic domain structure were identified in the same images, leading to unambiguous information on the role played by the former. Characteristic of the micromagnetic state of the samples was a high density of 360 degrees wall segments that showed quite remarkable resistance to annihilation. Following a description of the domain walls generated in both easy and hard axis magnetization cycles, a model is proposed for the way the observed domain walls respond when their ends are strongly pinned and, using this, we account for their continued existence over an extended number of magnetization cycles. Finally, the implications for device performance are discussed briefly.
机译：电子显微镜已被用来直接确定人工引入的粗糙度对软高弯矩多层膜中发生的微磁过程的影响。在同一张图像中识别出了用来使基底变粗糙的纳米缺陷和局部磁畴结构，从而获得了关于前者所起作用的明确信息。样品的微磁状态的特征是高密度的360度壁段，显示出显着的抗ni灭性。在描述了在易磁化磁道和硬轴磁化周期中生成的畴壁之后，针对所观察到的畴壁在其端部被强力钉扎时的响应方式提出了一个模型，并以此为基础解释了它们在扩展数目上的持续存在磁化周期。最后，简要讨论了对设备性能的影响。

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