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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Pressure dependence of the nitrogen atom recombination probability in late afterglows
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Pressure dependence of the nitrogen atom recombination probability in late afterglows

机译：余辉后期氮原子重组概率的压力依赖性

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摘要

Atomic nitrogen recombination probabilities (gamma(N)) are presented for different materials. They were obtained under late afterglow conditions through a comparison between local measurements of the nitrogen atom density with two-photon absorption laser-induced fluorescence (TALIF) and calculations of atomic concentration profiles in the vicinity of substrates. A comparison is also made between a spatially resolved technique (TALIF) and a non-spatially resolved one (based on optical emission spectroscopy) for the measurement of N-atom concentration. For each of the studied materials, an inverse pressure dependence of gamma(N) was observed, while the obtained data were found to be in good agreement with previously published values, derived from surface temperature measurements.
机译：提出了不同材料的原子氮重组概率（γ（N））。它们是在余辉较晚的条件下，通过比较氮原子密度与双光子吸收激光诱导的荧光（TALIF）的局部测量值和计算基体附近原子浓度分布曲线之间的比较而获得的。还比较了空间分辨技术（TALIF）和非空间分辨技术（基于光发射光谱法）来测量N原子浓度。对于每种研究的材料，观察到γ（N）的反压力依赖性，而发现获得的数据与先前公布的从表面温度测量得出的值高度吻合。

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