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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Structure-properties relationship in reactively sputtered Ag-Cu-O films
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Structure-properties relationship in reactively sputtered Ag-Cu-O films

机译:反应溅射Ag-Cu-O薄膜的结构-性能关系

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Ag-Cu-O films were deposited on glass substrates by pulsed dc sputtering of a silver-copper target (Ag50Cu50) in reactive Ar-O-2 mixtures. The film chemical composition was estimated by x-ray energy dispersive spectrometry and the structure was studied by x-ray diffraction (XRD). Optical properties (reflectance and transmittance) and room temperature electrical resistivity were evaluated using spectrophotometry and the four point probe method, respectively. Since silver atoms are less reactive versus oxygen than copper ones, the increase in the oxygen flow rate introduced into the deposition chamber induced the preferential oxidation of sputtered copper atoms. XRD analysis showed that the structure of the deposited films can be divided into three domains. At low oxygen flow rate, the films were biphased (metallic silver-based solid solution and crystalline copper-based oxide). At intermediate oxygen flow rate, the films were x-ray amorphous (grain size lower than 2 nm). At high oxygen flow rate, the films contained a crystalline silver-copper oxide phase and a crystalline unknown phase. Thanks to the absorption band of silver in the UV range, reflectance measurements were used to show the occurrence of metallic silver phase in the films. It was shown that the chemical environment of silver atoms in the x-ray amorphous region evolved from metallic to oxide when the oxygen flow rate increased. Transmittance evolution versus the oxygen flow rate were well correlated with that of the electrical resistivity. The evolution of Ag-Cu-O film properties was discussed in connection with the structure and chemical composition.
机译:通过在反应性Ar-O-2混合物中进行银铜靶(Ag50Cu50)的脉冲dc溅射,将Ag-Cu-O膜沉积在玻璃基板上。通过X射线能量色散光谱法估计膜的化学组成,并通过X射线衍射(XRD)研究结构。使用分光光度法和四点探针法分别评价光学性质(反射率和透射率)和室温电阻率。由于银原子相对于氧的反应性比铜原子低,因此引入沉积室的氧气流速的增加引起溅射铜原子的优先氧化。 XRD分析表明,沉积膜的结构可分为三个区域。在低氧气流速下,薄膜是双相的(金属银基固溶体和结晶铜基氧化物)。在中等氧气流速下,薄膜是X射线无定形的(晶粒尺寸小于2 nm)。在高氧气流速下,膜包含结晶的银-铜氧化物相和结晶的未知相。由于银在紫外线范围内的吸收带,因此使用反射率测量来显示膜中金属银相的出现。结果表明,随着氧气流量的增加,X射线非晶区中银原子的化学环境从金属演化为氧化物。透光率随氧气流量的变化与电阻率的相关性很好。结合结构和化学组成讨论了Ag-Cu-O薄膜性能的演变。

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