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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Surface modification layer deposition on flexible substrates by plasma-enhanced chemical vapour deposition using tetramethylsilane-oxygen gas mixture
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Surface modification layer deposition on flexible substrates by plasma-enhanced chemical vapour deposition using tetramethylsilane-oxygen gas mixture

机译：使用四甲基硅烷-氧气混合物通过等离子体增强化学气相沉积在柔性基板上进行表面改性层沉积

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摘要

Silicon-containing thin films were synthesized from a tetramethylsilane (TMS) -oxygen gas mixture by plasma-enhanced chemical vapour deposition to modify the surface properties of a flexible plastic substrate. The surface wettability was strongly correlated with the presence of hydrocarbon-and hydroxyl-related bonds in the films. The presence of inorganic Si-O-Si networks in the deposited film, originating from an additional oxygen reactant in the glow discharge, significantly increased plastic substrate hardness. Surface uniformity of the inorganic SiOx film varied with mechanical hardness. All such properties were degraded by increased oxygen ion bombardment during the deposition. Additionally, the atomic ratios of O to Si in the deposited films increased at a rate proportional to the oxygen reactant in the gas mixture and brought about a reduction in the optical refractive index. The hard coatings prepared using the TMS -oxygen gas mixture effectively reduced the permeability of the plastic substrate to water vapour. A low water vapour transmission rate was achieved using the film with a high packing density under adequate oxygen ion bombardment.
机译：通过等离子体增强化学气相沉积法从四甲基硅烷（TMS）氧气混合物中合成含硅薄膜，以改变柔性塑料基板的表面性能。表面润湿性与膜中存在烃和羟基相关的键密切相关。源于辉光放电中额外的氧气反应物，沉积膜中存在无机Si-O-Si网络，大大提高了塑料基材的硬度。无机SiO x膜的表面均匀性随机械硬度而变化。在沉积过程中，氧离子轰击会增加所有这些性能。另外，沉积膜中O与Si的原子比以与气体混合物中的氧反应物成比例的速率增加，并导致光学折射率降低。使用TMS-氧气混合物制备的硬质涂层有效降低了塑料基材对水蒸气的渗透性。在适当的氧离子轰击下，使用具有高堆积密度的薄膜可实现低水蒸气透过率。

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