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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Effect of indium dopant on surface and mechanical characteristics of ZnO : In nanostructured films
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Effect of indium dopant on surface and mechanical characteristics of ZnO : In nanostructured films

机译：铟掺杂对纳米结构膜中ZnO表面和力学性能的影响。

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Epitaxial ZnO : In nanorod films were grown on SiO2 substrates using a chemical solution method with a pre-coated ZnO sputtered seed layer. Structural and surface characterizations of the ZnO : In nanostructured films were achieved by means of x-ray diffraction, a scanning electron microscope, an atomic force microscope and contact angle measurements. The hardness and Young's modulus of the nanostructured films were investigated by nanoindentation measurements. The results showed that when the indium dopant was increased, the hardness and Young's modulus of the films also rose. The films exhibited hydrophobic behaviour with contact angles of about 128-138 degrees, and a decrease in the hardness and Young's modulus with decreasing loads or indentation depths. Buckling behaviour took place during the indentation process, and the fracture strength of the films was also discussed.
机译：外延ZnO：使用化学溶液法在SiO2衬底上生长纳米棒薄膜，并预先涂覆ZnO溅射种子层。 ZnO的结构和表面表征：通过X射线衍射，扫描电子显微镜，原子力显微镜和接触角测量来实现纳米结构薄膜中的ZnO ：。通过纳米压痕测量研究了纳米结构膜的硬度和杨氏模量。结果表明，当铟掺杂剂增加时，薄膜的硬度和杨氏模量也增加。膜表现出疏水特性，接触角约为128-138度，并且随着载荷或压痕深度的减小，硬度和杨氏模量降低。在压痕过程中发生了屈曲行为，并且还讨论了膜的断裂强度。

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