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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Mo bilayer for thin film photovoltaics revisited
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Mo bilayer for thin film photovoltaics revisited

机译:重新研究用于薄膜光伏的Mo双层

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摘要

Thin film solar cells based on Cu(In,Ga)Se~2 as an absorber layer use Mo as the back contact. This metal is widely used in research and in industry but despite this, there are only a few published studies on the properties of Mo. Properties such as low resistivity and good adhesion to soda lime glass are hard to obtain at the same time. These properties are dependent on the deposition conditions and are associated with the overall stress state of the film. In this report, a study of the deposition of a Mo bilayer is carried out by analysing first single and then bilayers. The best properties of the bilayer were achieved when the bottom layer was deposited at 10 × 10 ~(-3) mbar with a thickness of 500 nm and the top layer deposited at 1 × 10~(-3) mbar with a thickness of 300 nm. The films deposited under these conditions showed good adhesion and a sheet resistivity lower than 0.8ω□.
机译:基于Cu(In,Ga)Se〜2作为吸收层的薄膜太阳能电池使用Mo作为背接触。这种金属被广泛用于研究和工业中,但是尽管如此,关于Mo的性质只有很少的公开研究。同时难以获得诸如低电阻率和对钠钙玻璃的良好粘附性等性质。这些性质取决于沉积条件,并与薄膜的整体应力状态有关。在此报告中,通过分析第一个单层然后是双层来研究Mo双层的沉积。当底层以10×10〜(-3)mbar沉积厚度为500 nm,顶层以1×10〜(-3)mbar沉积厚度为300 nm时,双层的最佳性能得以实现。纳米在这些条件下沉积的膜表现出良好的粘附性并且薄层电阻率低于0.8ω□。

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