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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Atomic oxygen recombination on fused silica: modelling and comparison to low-temperature experiments (300 K)
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Atomic oxygen recombination on fused silica: modelling and comparison to low-temperature experiments (300 K)

机译:熔融石英上的氧原子重组:与低温实验(300 K)的建模和比较

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摘要

This work is devoted to the study of atomic oxygen recombination on a glass surface, mainly in connection with atomic sources development. Ln this paper we present a non-stationary model for atomic oxygen recombination on a fused silica surface. Kinetics equations for oxygen atoms, taking into account heterogeneous reactions between gaseous atoms and the surface (Eley-Rideal mechanisms), as well as homogeneous processes involving surface migration of adsorbed species (Langmuir-Hinshelwood mechanisms), are solved. Surface reaction coefficients an calculated, and the choice of numerical values for surface parameters is discussed. The solution to the equations is compared to our previous experiments concerning the influence of the surface state on atomic recombination. An estimation is made of surface reaction coefficient values. [References: 28]
机译:这项工作致力于玻璃表面原子氧复合的研究,主要与原子源的发展有关。在本文中,我们提出了一种在熔融石英表面进行原子氧重组的非平稳模型。求解了氧原子的动力学方程,其中考虑了气态原子与表面之间的异相反应(Eley-Rideal机理)以及涉及吸附物质表面迁移的均匀过程(Langmuir-Hinshelwood机理)。计算了表面反应系数a,并讨论了表面参数的数值选择。将该方程的解与我们先前关于表面状态对原子重组的影响的实验进行了比较。对表面反应系数值进行估算。 [参考:28]

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