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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >LIFE TIME OF A REFRACTORY CATHODE DOPED WITH A WORK-FUNCTION-LOWERING DOPANT
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LIFE TIME OF A REFRACTORY CATHODE DOPED WITH A WORK-FUNCTION-LOWERING DOPANT

机译：掺有降低工作功能掺杂剂的耐高温阴极的寿命

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The diffusion of dopant atoms to the surface of a refractory cathode doped with a lowering work-function dopant is considered. The variations of the cathode temperature with time and with the coordinate along the cathode length are taken into account. It is shown that, depending on the value of phi(min), the work function at the monolayer coverage, there are two possible scenarios of cathode temperature development. At low phi(min), the cathode experiences instability which leads to cleaning of the surface from adatoms and to a sharp rise in temperature. At higher phi(min), the cathode temperature changes gradually. The cathode service time, as a period of time when the dopant surface concentration falls and the cathode temperature raises, is estimated. It is shown that a properly organized temperature distribution inside the cathode may increase its service life several times. [References: 16]
机译：考虑到掺杂剂原子向掺杂有降低的功函掺杂剂的耐火阴极的表面扩散。考虑到阴极温度随时间以及沿阴极长度的坐标的变化。结果表明，取决于phi（min）的值，在单层覆盖率下的功函数，存在两种可能的阴极温度升高情况。在低phi（min）时，阴极会发生不稳定，这会导致清洁表面上的杂质，并导致温度急剧上升。在较高的phi（min）下，阴极温度逐渐变化。估计阴极工作时间，作为掺杂剂表面浓度下降和阴极温度升高的时间。结果表明，在阴极内部适当组织的温度分布可以将其使用寿命延长数倍。 [参考：16]

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